Silicon nitride optical waveguide and manufacturing method thereof
A silicon nitride photonics and manufacturing method technology, applied in the field of integrated optics, can solve the problems of unfavorable miniaturization of optical devices, device failure, large lattice mismatch, etc., and achieve enhanced optical confinement effect, which is beneficial to miniaturization and internal stress Reduced effect
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[0037] During the formation process of the existing silicon nitride optical waveguide, it is grown in one direction along the silicon-based substrate. Therefore, due to the lattice mismatch between silicon nitride and silicon-based materials, the silicon nitride optical waveguide The internal stress is relatively large, resulting in a thinner critical thickness of the silicon nitride optical waveguide. The thinner silicon nitride optical waveguide has a weaker confinement effect on the optical signal, and the light spot formed by the outgoing light is larger, which is not conducive to optical devices. miniaturization.
[0038] It should be noted that the critical thickness of the silicon nitride optical waveguide refers to the thickness of the silicon nitride optical waveguide formed on the silicon-based substrate when it is peeled off from the silicon-based substrate.
[0039] In order to solve the above technical problems, the present application provides a method for manufa...
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