A Metal Mesh Transparent Electrode Designed Using the Principle of Fractal Geometry
A technology of metal grid and fractal geometry, applied in the direction of the conductive layer on the insulating carrier, can solve the problems of the decrease of the conductivity of the transparent electrode, the inability to measure the conductivity index, and the few contact points of the test probe, so as to improve the transparency. Optical and conductive performance, improved comprehensive photoelectric performance, and flexible and changeable pattern design
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Embodiment 1
[0032]With quartz glass as the substrate. A glass substrate with an area of 15 mm × 15 mm was ultrasonically cleaned in deionized water, acetone, and absolute ethanol for 10 min, and then taken out and dried with a nitrogen gun for later use. The glass substrate was then placed on the sample stage of a magnetron sputtering coater, and 200 nm thick Ag (Ag target purity of 99.99%). Then place the Ag / glass substrate on the sample stage of the laser, adjust the position of the sample stage so that the focus of the laser beam emitted by the laser is located at 1.0 mm above the Ag / glass surface after being focused by the lens, and the grid width is drawn by using EZCAD software respectively. 0.2 mm, a regular periodic grid pattern with a grid spacing of 1.8 mm, such as figure 1 Shown in (a); a regular periodic grid pattern with a grid spacing of 0.8 mm, such as figure 1 As shown in (b); the square two-level fractal geometric pattern with grid spacing of 1.8 mm and 0.8 mm, such ...
Embodiment 2
[0035] With quartz glass as the substrate. A glass substrate with an area of 15 mm × 15 mm was ultrasonically cleaned in deionized water, acetone, and absolute ethanol for 10 min, and then taken out and dried with a nitrogen gun for later use. The glass substrate was then placed on the sample stage of a magnetron sputtering coater, and 200 nm thick Ag (Ag target purity of 99.99%). Then place the Ag / glass substrate on the sample stage of the laser, adjust the position of the sample stage so that the focus of the laser beam emitted by the laser is located at 1.2 mm above the Ag / glass surface after being focused by the lens, and the grid width is drawn by using EZCAD software respectively. 0.2 mm, a regular periodic grid pattern with a grid spacing of 1.8 mm, such as image 3 Shown in (a); a regular periodic grid pattern with a grid spacing of 0.8 mm, such as image 3 Shown in (b); a regular periodic grid pattern with a grid spacing of 0.3 mm, such as image 3 As shown in ...
Embodiment 3
[0038] The FTO film is selected as the substrate. The FTO substrate with an area of 15 mm × 15 mm was placed in deionized water, acetone, and absolute ethanol for 10 min and ultrasonically cleaned, and then it was taken out and dried with a nitrogen gun for later use. Then, spin-coat a layer of 10 wt% PVP / ethanol mixed solution on the surface of the FTO substrate through a homogenizer. During the spin-coating process, control the speed of the homogenizer to 1000 rpm, spin-coating time 1min, and place it in an oven after the spin-coating is completed. Dry for 20 min (50 °C, 40 W) to remove residual ethanol to obtain a PVP / FTO substrate. Then place the PVP / FTO substrate on the sample stage of the laser, adjust the position of the sample stage so that the focus of the laser beam emitted by the laser after being focused by the lens is located 1.3 mm above the surface of the PVP / FTO, and the side length is drawn by EZCAD software to be 1.0 Regular hexagonal periodic grid pattern...
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