Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cleaning system used for metal mask plate

A metal mask and cleaning system technology, which is applied in the field of metal mask cleaning, can solve problems such as high system input cost and operating cost, unreasonable structural design, and difficulty in meeting user requirements, achieving a high degree of automation, fixed and reliable , reduce the effect of volatilization

Pending Publication Date: 2019-02-26
湖北浚山光电有限公司
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the problem that the current cleaning system used for cleaning the metal mask plate is not reasonable in its own structure design, its cleaning effect is not good, it is difficult to meet the user's requirements, and at the same time, the system input cost and operating cost are relatively high. A Cleaning System for Metal Masks

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cleaning system used for metal mask plate
  • Cleaning system used for metal mask plate
  • Cleaning system used for metal mask plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] see figure 1 , Figure 14 , the present embodiment includes a closed workshop 1, a row of several cleaning tanks is placed on the ground in the workshop 1, a dehydration tank 5 is installed at the rear end of the cleaning tank, and two longitudinal beams 2 are installed on the top of the cleaning tank in the workshop 1. A manipulator 6 is installed on the longitudinal beam 2, and the cleaning system also includes a spreader 7 for loading metal mask plates. The manipulator 6 can lift or translate the spreader 7; the cleaning tank includes a bubbling cleaning tank 3, an alcohol cleaning tank 4.

[0045] see Figure 2-4 The bubbling cleaning tank 3 in this embodiment comprises a rectangular tank 31 with an open upper end, a water inlet pipe 33 is installed on the side wall of the tank body 31, a water outlet pipe 37 is installed at the bottom of the tank body 31, and a water outlet pipe 37 is installed on the outer side of the tank body 31 A blower 34, the air outlet of...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of metal mask plates, in particular to a cleaning system used for a metal mask plate. The system includes a closed workshop, a row of cleaning tanks are placed on the floor in a workshop, and dewatering tanks are installed at the back ends of the cleaning tanks. The system is characterized in that two longitudinal beams are installed above the cleaningtanks in the workshop, two longitudinal beams are provided with mechanical arms, the cleaning system further includes a lifting appliance used for loading the metal mask plate, and the mechanical armscan lift or horizontally move the lifting appliance. The cleaning tanks include bubble cleaning tanks and alcohol cleaning tanks. The cleaning efficiency is higher, the cleaning effect is better, theoperation cost is lower, and the system is suitable for improvement of an existing metal mask plate cleaning machine.

Description

technical field [0001] The invention relates to the technical field of metal mask plate cleaning, in particular to a cleaning system for metal mask plates. Background technique [0002] Organic electroluminescent devices have many advantages, such as self-luminescence, fast response time, wide viewing angle, low cost, simple manufacturing process, good resolution and high brightness, and are considered to be the emerging application technology of next-generation flat-panel displays. In OLED (Organic Light-Emitting Diode, organic light-emitting diode) technology, the mask used for vacuum evaporation is a very important and critical component, and the quality of this component directly affects the quality and manufacturing cost of OLED products. [0003] Masks, especially fine masks with fine meshes, will leave particles such as metal scraps in the mesh or on the surface after initial processing, which affects the normal use of the mask. In the process of recycling, impuritie...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B08B3/10B08B3/08B08B3/14B08B13/00B08B15/00F26B21/00
CPCF26B21/004B08B3/08B08B3/102B08B3/14B08B13/00B08B15/00B08B2203/007
Inventor 唐军
Owner 湖北浚山光电有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products