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Shape detection device and shape detection method

A detection device and shape technology, applied in the field of shape detection devices, can solve problems such as interference pattern influence, reflectivity difference, large shape calculation, etc., and achieve the effect of improving measurement accuracy and measurement efficiency

Active Publication Date: 2020-09-22
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the reflection between the thin film interfaces will affect the interference pattern, resulting in a large shape calculation error, especially when there are multiple wavelengths in a large-range shape measurement system
In addition, for different samples or the same sample contains both filmed and non-filmed areas, there will be large differences in reflectance, which will affect the contrast of interference fringes and cause measurement errors

Method used

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  • Shape detection device and shape detection method
  • Shape detection device and shape detection method
  • Shape detection device and shape detection method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] Such as figure 1 As shown, the present invention provides a shape detection device. The shape detection device includes a light source generator 10, a digital micromirror device 20 (DMD, Digital Micromirror Device), a detector 30, and an industrial computer 70. The light source generates The device 10 includes a three-dimensional measurement light source generator 11 and a spectrum measurement light source generator 12. The light beam formed by the light source generator 10 forms a probe light and a reference light through a spectroscope. The probe light includes the three-dimensional measurement light source generator 11 The three-dimensional probe light and the spectral probe light formed by the spectral measurement light source generator 12, the reference light includes the three-dimensional reference light formed by the three-dimensional measurement light source generator 11 and the spectral reference formed by the spectral measurement light source generator 12 Light,...

Embodiment 2

[0079] In this embodiment, the three-dimensional measurement light source generator 11 emits light beams of multiple wavelengths, the spectrum measurement light source generator 12 emits narrow-band light beams covering the wavelength range of the multiple light beams, and the number of the detectors 30 is the same as that of the The number of light beams formed by the three-dimensional measuring light source generator 11 is the same, and corresponds to light beams of different wavelengths one to one. The number of the digital micromirror devices 20 is the same as the number of light beams formed by the three-dimensional measuring light source generator 11, and can also correspond to light beams of different wavelengths one-to-one. The following three-dimensional measurement light source generator 11 emits two different wavelengths λ 1 , Λ 2 The light beam is taken as an example.

[0080] Such as Figure 5 As shown, in this embodiment, the detector 30 includes a first detector 31...

Embodiment 3

[0086] Such as Image 6 As shown, the detector 30 in this embodiment includes a third detector 33 and a fourth detector 34. The third detector 33 is used for detecting the three-dimensional measurement interference fringes, and the fourth detector 34 is used for For detecting the spectrum measurement interference fringes, the number of the digital micromirror device 20 is at least one, and each of the digital micromirror devices 20 is arranged in order so that the reference light incident on the digital micromirror device 20 They are sequentially reflected to the next digital micromirror device 20. Specifically, in this embodiment, the fourth beam splitter 46 is not added, and the digital micromirror device 20 includes a third digital micromirror device 23 and a fourth digital micromirror device 24, and other parts can be used in the second embodiment. Plan. Similarly, this embodiment also uses the three-dimensional measurement light source generator 11 to emit two different w...

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Abstract

The present invention provides a morphology detection device and a morphology detection method. The morphology detection device comprises a source generator, a digital micromirror device, a detector and an industrial personal computer, the source generator comprises a three-dimensional measurement light source generator and a spectral measurement light source generator, the light beam formed by the source generator form detection light and reference light through a spectroscope, the digital micromirror device reflects the reference light to form standard light, the detection light is irradiated to a surface to be detected to form object surface light through reflection, and the object surface light and the standard light reach the detector through the spectroscope. The morphology detectiondevice forms the detection light and the reference light to achieve switching of measurement states, the detector detects the object surface light and the standard light, the detector can obtain thereflection wave front phase distribution and reflectivity spectral distribution of the surface to be detected through two different light generators so as to perform synchronous detection and compensation for the reflectance spectrum and a three-dimensional outline of complex thin film materials.

Description

Technical field [0001] The invention relates to the field of semiconductor technology, in particular to a shape detection device and a shape detection method. Background technique [0002] In the field of semiconductor technology, with the continuous development of technology, the requirements for semiconductor devices are becoming higher and higher. It is necessary to detect the surface topography features of wafers, chips or other objects to be tested, such as height, thickness and hole depth Etc., a higher vertical resolution can be obtained by using interferometric technology, which is one of the commonly used optical detection methods. [0003] Since there are transparent films on the tested samples in many measurement scenarios, the film thickness and the topography distribution of the substrate surface need to be measured at this time. However, the reflection between the film interface will affect the interference pattern and cause a large topography calculation error, espe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24G01J3/42
CPCG01B11/2441G01J3/42G01J2003/425
Inventor 杜艳伟周钰颖张鹏黎王帆
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD