Substrate, preparation method thereof and display panel
A substrate and area technology, applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as large area and storage capacitor occupation
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[0046] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0047] An embodiment of the present invention provides a substrate, such as Figure 1a-Figure 1c , Figure 2a-Figure 2c As shown, it includes a substrate 10 and a first TFT 11 disposed on each sub-pixel region on the substrate 10; the first TFT 11 includes a first active layer 21 and a first gate 41; the first active layer 21 includes a first active layer 21 The source region 211, the first conductorized region 212 and the second conductorized region 213 loca...
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Abstract
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