Metal organic compound feeding control system

Abstract

The invention relates to the technical field of semiconductor manufacturing, in particular to a metal organic compound feeding control system. The metal organic compound feeding control system comprises a metal organic compound storage tank, and is characterized in that the top of the metal organic compound storage tank is in communication with an air carrier pipeline and an output pipeline at thesame time, an air inlet manual valve, a one-way check valve, a first three-way pneumatic valve, a second three-way pneumatic valve, an electric pressure regulator, a gas carrying purification systemand a gas carrying particle filtering system are sequentially arranged on the air carrier pipeline in sequence; the second three-way pipeline is also connected with a vacuum pipeline at the same time;an air outlet manual valve, the third three-way pneumatic valve, a pneumatic valve and a reaction chamber are sequentially arranged on the output pipeline in sequence; and the third three-way pneumatic valve is in communication with the first three-way pneumatic valve. According to the metal organic compound feeding control system, the problems of pipeline blockage and process product quality caused by particle impurities, water vapor, oxygen and the like carried by the gas carrying are solved.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to an organometallic chemical vapor deposition process control system. Background technique [0002] Metal-organic compounds are important raw materials in the semiconductor industry for the preparation of high-brightness organic light-emitting diodes, semiconductor lasers, and high-efficiency solar cells. Prone to violent reactions. It has extremely high requirements on processing technology and control. Especially in the field of OLED manufacturing, in the process of processing, it is necessary to ensure that the flow rate of metal-organic compounds entering the reaction chamber is stable, and it cannot contain foreign impurities that affect product quality. [0003] Nowadays, most metal organic compounds are used as precursors and introduced into the reaction chamber for product manufacturing. The method is mainly to enter the metal organic compound containe...

AI Technical Summary

Problems solved by technology

[0004] 1) Carrier gas in most enterprises is generally transported through pipelines. Long-term use will carry impurities in the pipeline or the carrier gas into the precursor storage tank, block the gas path, and cause product quality defects if impurities enter the reaction chamber;

[0005] 2) The purity of the carrier gas is not high, especially if the content of water vapor and oxygen exceeds the standard, it will cause the reaction with the precursor to reduce the quality of the precursor, resulting in product quality defects or causing danger;

[0006] 3) After the carrier gas enters the precursor storage tank, the uniformity of mixing cannot be controlled due to the free diffusion of the carrier gas, so the outflow content of the precursor cannot be guaranteed to be constant

With the entry of the carrier gas, due to the inconsistency of the partial pressure of each component, the outflow of the precursor is not constant or even decreases, resulting in a decline in product yield and quality problems

Images