A kind of titanium electrode and its preparation method and application
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[0027] In addition, the present application also provides a method for preparing the above-mentioned titanium electrode, which may include the following steps: preparing a silver interlayer on the surface of the titanium substrate, and setting a bismuth titanium tin active layer on the surface of the silver interlayer away from the titanium substrate , followed by annealing.
[0028] Wherein, the preparation of the silver intermediate layer includes: using methods such as magnetron sputtering, electroplating, evaporation coating or chemical vapor deposition to cover silver on the surface of the titanium substrate to form a silver intermediate layer of required thickness.
[0029] In some embodiments, before the silver interlayer is provided, pretreatment of the titanium substrate is also included. The pretreatment may include, for example: grinding or sandblasting the titanium substrate, alkali washing and pickling.
[0030] As an option, grinding may be repeated rubbing the ...
Embodiment 1
[0040] Titanium substrate pretreatment:
[0041] The titanium substrate was repeatedly polished with 80-grit and 400-grit sandpaper in turn until the titanium plate showed a metallic luster. The polished titanium substrate was ultrasonicated with deionized water for 10 min, then placed in 40 wt% NaOH solution, and heated for 1 h in a water bath at 95°C. After alkali washing, the titanium sheet was taken out and ultrasonicated with deionized water for 10 minutes, then the titanium sheet was placed in 50 vol% HCl solution, and kept in a water bath at 90° C. for 1 hour. After pickling, it was ultrasonically cleaned with deionized water, and then dried with nitrogen flow.
[0042]Preparation of the middle layer:
[0043] A silver intermediate layer with a thickness of 100nm was prepared on the treated titanium substrate by magnetron sputtering. The background vacuum during deposition is 4.5×10 -4 Pa, the flow rate of argon gas is 20sccm, and the working pressure is controlled ...
Embodiment 2
[0048] Titanium substrate pretreatment:
[0049] The titanium substrate was sandblasted with 220 mesh quartz sand. The sandblasted titanium substrate was ultrasonicated with deionized water for 10 minutes, then placed in acetone solution, and ultrasonicated for 40 minutes. After degreasing, the titanium sheet was taken out and ultrasonicated with deionized water for 10 minutes, and then the titanium sheet was placed in a 10 wt% oxalic acid solution and kept in a water bath at 95° C. for 1 hour. After pickling, the titanium plates were ultrasonically cleaned in deionized water, and then dried with nitrogen flow for later use.
[0050] Preparation of the middle layer:
[0051] A silver intermediate layer with a thickness of 1000nm is prepared on the treated titanium substrate by electrodeposition. Silver foil with a purity of 99.99% is used as the anode, the titanium substrate is used as the cathode, and the electrolyte is a mixed solution of silver chloride (30g / L), potassiu...
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