A method for automatic control of polysilicon reduction furnace

A reduction furnace and polysilicon technology, applied in the direction of program control, computer control, general control system, etc., can solve the problems that employees do not understand the production status of the reduction furnace, cannot adjust in time, and misdirect, so as to improve the apparent quality and reduce work volume, reducing the effect of cracks or inverted rods

Active Publication Date: 2021-07-13
ORISI SILICON
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AI Technical Summary

Problems solved by technology

This control method requires a high level of experience for on-site personnel, and after taking over the shift, the employees do not understand the production status of the previous reduction furnace, which is prone to misdirection; in addition, due to the limited number of on-site personnel, they cannot always keep an eye on the production status of the reduction furnace. When the situation in the furnace changes, it cannot be adjusted in time, and it is prone to serious quality problems such as falling rods, atomization, and looseness.

Method used

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  • A method for automatic control of polysilicon reduction furnace
  • A method for automatic control of polysilicon reduction furnace
  • A method for automatic control of polysilicon reduction furnace

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Embodiment 1

[0069] Such as figure 1 , figure 2 A polysilicon shown in the present invention is automatically controlled by the temperature measuring device 1 and the imaging device 2, and the silicon rod of the silicon rod is collected in the furnace 3, and uploaded to the industrial computer 5 for data recording, image analysis and Logic operation, obtain reductant furnace current, reducing furnace feed, and reducing furnace ratio of each time period, and control the reduction furnace actuator 7 action, realizing the temperature, reducing furnace feed amount and reducing furnace each time segment Automatic control of the ratio.

[0070] The reducing furnace temperature automatic control step is specifically:

[0071] (1) After the reducing furnace is initially feed, start recording the silicon rod temperature, in practical applications, typically set to start recording silicon rod temperature after 3 minutes or 5 minutes of initial feed; initial first hour, initial current Press A 1 Average ...

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Abstract

The invention discloses an automatic control method for a polysilicon reduction furnace. The silicon rod temperature and the growth image of the silicon rod in the reduction furnace are collected by a temperature measuring device and a camera device, and uploaded to an industrial computer for data recording, image analysis and logic operation to obtain each The current of the reduction furnace, the amount of feed to the reduction furnace and the proportion of the reduction furnace in a period of time are used to control the action of the actuator of the reduction furnace to realize the automatic control of the temperature of the reduction furnace, the amount of feed to the reduction furnace and the proportion of the reduction furnace in each period of time. The advantages are: the present invention can control the reduction furnace in the optimal operating state, reduce the occurrence of cracks or downturning of silicon rods, improve the apparent quality of polysilicon, reduce the experience requirements for on-site personnel, and reduce the workload of operators. The amount reduces the power consumption of the reduction furnace and saves the raw material gas.

Description

Technical field: [0001] The present invention relates to the field of polysilicon reduction, and more particularly to a polysilicon further furnace automatic control method. Background technique: [0002] Polysilicon is the basic raw material of the electronics industry and the solar industry, which is widely used in semiconductor chips, high-performance sensors, fibers, solar panels, and the like. At present, polysilicon production technology at home and abroad uses a modified Siemens method, i.e., by chemical vapor deposition reaction in high temperature silicon rods energized in the reducing furnace under high temperature conditions, and obtain high purity polysilicon until the furnace The rod has gradually increased to the prescribed flyer. During the growth of silicon rods, the deposition rate of the silicon rod in the reducing furnace is an important factor in determining the quality of the silicon rod, and the deposition rate of the silicon rod is also the surface temperat...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B19/042C01B33/035
CPCC01B33/035G05B19/042
Inventor 姜海明吴锋杨媛丽曹忠陈晓军
Owner ORISI SILICON
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