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Apparatus and system for processing substrates in vacuum chamber and method of transporting carriers in vacuum chamber

A technology of vacuum chambers, carriers, applied in positioning and aligning substrate carriers and mask carriers, transporting carriers in vacuum chambers, transportation field

Active Publication Date: 2021-04-13
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In particular, accurate and smooth transport of substrate carriers and mask carriers by vacuum systems is challenging

Method used

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  • Apparatus and system for processing substrates in vacuum chamber and method of transporting carriers in vacuum chamber
  • Apparatus and system for processing substrates in vacuum chamber and method of transporting carriers in vacuum chamber
  • Apparatus and system for processing substrates in vacuum chamber and method of transporting carriers in vacuum chamber

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Embodiment Construction

[0025] Reference will now be made in detail to various embodiments of the present disclosure, one or more examples of which are illustrated in the accompanying drawings. In the following description of the drawings, the same reference numerals refer to the same components. Usually only differences with respect to individual implementations are described. The various embodiments are provided by way of explanation of the disclosure, not limitation of the invention.

[0026] Additionally, features illustrated or described as part of one embodiment can be used on or in combination with other embodiments to yield still further embodiments. This description is intended to cover such modifications and variations.

[0027] Figure 1A is a schematic cross-sectional view of an apparatus 100 for processing a substrate 10 according to embodiments described herein, wherein the first carrier 11 is in a first position. Figure 1B show Figure 1A The device 100, wherein the first carrier 1...

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Abstract

An apparatus (100) for processing a substrate (10) in a vacuum chamber (101) is described. The apparatus comprises a first carrier transport system, an alignment system (20, 120), a first displacement device (41, 141) and a common support structure (50, 150); the first carrier transport system is configured to move along the A transport path transports the first carrier (11) in a first direction (X); the alignment system (20, 120) includes a first mount (21, 120) for mounting the first carrier (11) to the alignment system 121); the first displacement device (41, 141) is configured to move the first carrier from the first transport path to the first mount in a second direction (Z), the second direction being transverse to the first direction (X) The common support structure (50, 150) supports or holds at least a part of the alignment system (20, 120) and at least a part of the first displacement means (41, 141). In addition, a system for processing a substrate and a method of transporting a carrier in a vacuum chamber are described.

Description

technical field [0001] The present disclosure relates to apparatus and systems for processing substrates in vacuum chambers, and methods of transporting carriers in vacuum chambers. More specifically, a method of transporting, positioning and aligning a substrate carrier and a mask carrier in a vacuum chamber is described. In particular, the present disclosure relates to depositing a coating material on a substrate, wherein the substrate is aligned relative to a mask prior to the deposition. The methods and apparatus described herein can be used to fabricate organic light-emitting diode (OLED) devices. Background technique [0002] Techniques for depositing layers on the substrate include, for example, thermal evaporation, physical vapor deposition (PVD) and chemical vapor deposition (CVD). Coated substrates can be used in several applications and in several technical fields. For example, the coated substrate can be used in the field of organic light emitting diode (OLED)...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/50C23C16/04C23C16/458H01L21/68H01L51/00H10K99/00
CPCC23C14/042C23C14/50C23C16/042C23C16/4587H01L21/682H01L21/6715H01L21/67709H01L21/67712H01L21/6831H10K71/166H01L21/6773H01L21/67276H01L21/68H01L21/67201H01L21/68707H01L21/02H10K71/00
Inventor 马蒂亚斯·赫曼尼斯安娜贝儿·霍夫曼
Owner APPLIED MATERIALS INC