Ultrasonic fluidized atomic layer deposition device for fully dispersing and coating of micro-nanometer particles

Abstract

The invention belongs to the vacuum coating related technical field, and discloses an ultrasonic fluidized atomic layer deposition device for fully dispersing and coating of micro-nanometer particles.The ultrasonic fluidized atomic layer deposition device comprises a carrier gas and reaction precursor supply component, a reaction chamber and an ultrasonic vibration component, wherein the carriergas and reaction precursor supply component provides precursor reactants, carrier gas and inert gas required in the purging process for atomic layer deposition reaction; the reaction chamber is used as a generation site of atomic layer deposition reaction, and precursors enter the reaction chamber part to be deposited to form a film on a base surface; and the ultrasonic vibration component is usedfor generating ultrasonic vibration and transferring the ultrasonic vibration to the reaction chamber part to crack the soft agglomeration among the micro-nanometer particles, so that the particles are in a dispersed state in the process of atomic layer deposition reaction, and the growth of a thin film on the surface of a single particle is realized. By the ultrasonic fluidized atomic layer deposition device, the defect that mass powder particles cannot be completely fluidized and dispersed only under the action of airflow can be overcome, and the nanometer particles are fully dispersed under the action of airflow and ultrasonic vibration.

Description

technical field [0001] The invention belongs to the technical field related to vacuum coating, and more specifically relates to an ultrasonic fluidized atomic layer deposition device for fully dispersing and coating micro-nano particles. Background technique [0002] Atomic layer deposition technology is a thin film deposition technology that grows a thin film in the form of a single atomic layer on the surface of a substrate through a gas-phase chemical reaction. During the atomic layer deposition reaction process, two or more precursor reactants enter the reaction chamber alternately in the form of gas through time isolation or space isolation, and saturate adsorption on the substrate surface or interact with substrate surface groups respectively. A saturated chemical reaction occurs, allowing thin films to grow on the substrate surface in the form of monoatomic layers. The atomic layer deposition reaction has "reaction self-limitation" because only one gas phase reactant...

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Problems solved by technology

[0004] In view of the above defects or improvement needs of the prior art, the present invention provides an ultrasonic fluidized atomic layer deposition device for fully dispersing and coating micro-nano particles, which combines the process of large-scale micro-nano particles in the atomic layer deposition process Characteristics and mechanism analysis, redesign of the composition and structure of the entire deposition device, and focus on improving the specific structure and setting method of the ultrasonic vibration module, correspondingly, it is not only possible to better overcome the incomplete fluidization of micro-nano particles under the action of airflow And it can ensure that the micro-nano particles are more fully and uniformly dispersed even under the condition of large batches. At the same time, it has the characteristics of quantitative adjustment according to the demand, and can effectively break the soft agglomeration of particles.

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