Etching monitoring device and etching monitoring method

Abstract

An etching monitoring device and an etching monitoring method. The etching monitoring device comprises: a plurality of monitoring units (1), each monitoring unit (1) comprising an incident light source (11) and a signal processing module (12) corresponding to the incident light source (11); each incident light source (11) is provided corresponding to an etching region of a substrate to be etched, different incident light sources (11) correspond to different etching regions (2); each incident light source (11) is used to emit incident light to the etching region (2) corresponding thereto; and each signal processing module (12) is used to receive reflection light, and convert the reflection light into a corresponding electrical signal according to the intensity of the reflection light, and an etching state of said substrate is determined by monitoring the variation of the electrical signals converted by the signal processing modules (12), effectively monitoring the etching process, providing accurate data for etching quality analysis, facilitating the development of the etching technique and the improvement of the etching precision.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an etching monitoring device and an etching monitoring method. Background technique [0002] With the development of display technology, liquid crystal displays (Liquid Crystal Display, LCD) and other flat display devices are widely used in mobile phones, televisions, personal Various consumer electronic products such as digital assistants, digital cameras, notebook computers, and desktop computers have become the mainstream of display devices. [0003] Most of the liquid crystal display devices currently on the market are backlight liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to place liquid crystal molecules between two parallel glass substrates. There are many vertical and horizontal small wires between the two glass substrates. The direction of the liquid crystal mo...

AI Technical Summary

Problems solved by technology

[0005] The etching process is often used in the production process of liquid crystal display panels, and the accuracy of the determination of the etching end point has a great influence on the effect of the etching process. The size of the processed substrate is 2*2m 2 As mentioned above, when etching the metal film on the surface of such a huge substrate, the etching accuracy is required to reach 0.05 microns and higher, and at the same time, the etching process is required to be able to complete the uniform etching of large-size panels. Lack of effective monitoring means to effectively monitor the etching quality

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