A method for densification of SIC materials based on reactive sintering of loose defects
A reaction and defect technology, which is applied in the dense field of reactive sintered SiC materials based on loose defects, can solve the problems of reduced strength, fragility, waste, etc., and achieve the effects of reducing manufacturing costs, easy operation and realization, and improving utilization rate
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specific Embodiment 1
[0030] A dense method based on loose defect reactive sintering of SiC materials, the method comprising:
[0031] Take the reaction sintering reaction sintering SiC material with a diameter of 200mm, a thickness of 11mm, and a margin of 1mm in the thickness direction; the theoretical Si content is 30%, and the SiC content is 70%; the reaction sintered SiC with several loose and loose defects inside is found by non-destructive testing. The material is wrapped with 20mm thick carbon fiber felt, placed in a vacuum sintering furnace, evacuated to below 10pa, heated to 1800°C at a heating rate of 50°C / h, and kept for 10h, so that silicon escapes from the loose defect reaction sintered SiC material , react with the carbonaceous material on the outer surface of the reaction sintered SiC material that wraps loose defects, remove silicon, and cool down to room temperature at a cooling rate of 50°C / h to obtain preform a (take out the material of preform a and weigh; preform a Only when t...
specific Embodiment 2
[0035] Put the reaction sintered SiC material with loose defects in vacuum, raise the temperature to 1600 °C at a heating rate of 40 °C / h, and keep it for 12 hours, so that silicon escapes from the reaction sintered SiC material with loose defects, and sinters with the reaction sintered SiC material that wraps loose defects The carbonaceous material on the outer surface of the SiC material reacts to remove silicon, wherein the carbonaceous material is multi-layer carbon fiber cloth, and the temperature is lowered to room temperature at a cooling rate of 40°C / h to obtain the preform a.
[0036] Grind the surface of preform a to remove 0.2mm from the surface of preform a, place a sufficient amount of silicon in a vacuum environment, contact the polished surface with silicon, raise the temperature to 1600°C at a heating rate of 60°C / h, and keep it warm for 0.8h , so that the silicon is melted and infiltrated into the preform a, and a dense reaction sintered SiC material is obtaine...
specific Embodiment 3
[0039] Place the reaction sintered SiC material with loose defects in vacuum, raise the temperature to 2000 °C at a heating rate of 60 °C / h, and keep it for 8 hours, so that silicon escapes from the reaction sintered SiC material with loose defects, and sinters with the reaction sintered SiC material that wraps loose defects The carbonaceous material on the outer surface of the SiC material reacts to remove silicon, wherein the carbonaceous material is porous carbon fiber felt or multi-layer carbon fiber cloth, and the temperature is lowered to room temperature at a cooling rate of 60°C / h to obtain the preform a.
[0040] Grind the surface of preform a to remove 0.2mm on the surface of preform a, place a sufficient amount of silicon in a vacuum environment, contact the polished surface with silicon, raise the temperature to 1450°C at a heating rate of 40°C / h, and keep it warm for 1.5h , so that the silicon is melted and infiltrated into the preform a, and a dense reaction sinte...
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