Cylindrical cathode non-equilibrium magnetron plasma gas cluster source and method of use thereof

A plasma, non-equilibrium technology, applied in the fields of atomic and molecular physics and nanoscience, which can solve the problems of limited cluster yield and cluster ion yield, and achieve high-intensity and high-ionization cluster and nanoparticle beams. The effect of flow, efficient and uniform growth

Active Publication Date: 2020-10-16
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, due to the planar magnetron sputtering target structure, this type of source has the disadvantage of limited cluster yield, especially cluster ion yield.

Method used

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  • Cylindrical cathode non-equilibrium magnetron plasma gas cluster source and method of use thereof
  • Cylindrical cathode non-equilibrium magnetron plasma gas cluster source and method of use thereof
  • Cylindrical cathode non-equilibrium magnetron plasma gas cluster source and method of use thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0025] A cylindrical cathode unbalanced magnetron plasma gas cluster source, the cluster source includes a cylindrical sputtering target assembly 1 and a condensation chamber 2, and the two are connected to each other; the cylindrical sputtering target assembly 1 is sequentially arranged There is an annular cathode magnet group 12 wrapped in a sealed interlayer 13. The cylindrical sputtering target 3 and the sputtering gas are filled into the cylinder 6. The sputtering gas is filled into the bottom plate 14 of the cylinder 6 through the sputtering gas inlet 9. The vent tube 16 is filled, and flows out to the glow area between the cylindrical sputtering target 3 and the sputtering gas filling cylinder 6 through the opening on the side wall 15; the condensation chamber 2 is a vacuum-sealed chamber, and the A condensation zone 10 is formed, a nozzle 11 is provided at the center of one end of the cavity, and a differential pumping condition is formed through the nozzle 11 and the h...

Embodiment 2

[0040] A cylindrical cathode unbalanced magnetron plasma gas cluster source, the cluster source includes a cylindrical sputtering target assembly 1 and a condensation chamber 2, and the two are connected to each other; the cylindrical sputtering target assembly 1 is sequentially arranged There is an annular cathode magnet group 12 wrapped in a sealed interlayer 13. The cylindrical sputtering target 3 and the sputtering gas are filled into the cylinder 6. The sputtering gas is filled into the bottom plate 14 of the cylinder 6 through the sputtering gas inlet 9. The vent tube 16 is filled, and flows out to the glow area between the cylindrical sputtering target 3 and the sputtering gas filling cylinder 6 through the opening on the side wall 15; the condensation chamber 2 is a vacuum-sealed chamber, and the A condensation zone 10 is formed, and a nozzle 11 is provided at the center of one end of the cavity, and a differential pumping condition is formed through the nozzle 11 and t...

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Abstract

The invention discloses a cylindrical cathode nonequilibrium magnetron plasma gas aggregation cluster source and a use method thereof. The cluster source includes a cylindrical sputtering target assembly and a condensation chamber which communicate with each other. According to the invention, the cylindrical sputtering target and an annular magnet group are used to make magnetron sputtering have alarge sputtering area and generate high yield of atoms and ions. A sputtering gas filled cylinder coaxial with the sputtering target is used to form an inert gas flow to guide sputtering products toa condensation zone, the sputtering products is further constrained by inert gas flowed out of the side wall of a buffer gas filled cylinder in the condensation zone, and so a condensation growth region of a cluster is defined in a certain space to achieve efficient and uniform growth of the cluster. A nonequilibrium magnetic field is formed by a constraint magnet of the condensation zone, and electrons are constrained to form high plasma density to obtain a high cluster iron ratio. The cylindrical cathode nonequilibrium magnetron plasma gas aggregation cluster source and the use method thereof can realize the generation of high-strength and high-ionization clusters and nanoparticle beams.

Description

technical field [0001] The invention belongs to the field of atomic and molecular physics and nano science and technology, and relates to a device widely used in the preparation of thin films and nanostructure materials and the surface processing of materials, specifically a cylindrical cathode non-equilibrium magnetron plasma gas cluster source and How to use it. Background technique [0002] The cluster source is the key component in the generation of atomic cluster (nanoparticle) beam, the study of the physical / chemical properties of cluster and the cluster beam deposition device. It has a wide range of applications in the preparation of materials and surface processing of materials. There are two types of cluster beam sources commonly used at present: gas aggregation method cluster source and pulse laser ablation method cluster source. The pulse laser ablation cluster source is mainly used for basic research on the singular structure and physical and chemical propertie...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32H01J37/34
CPCH01J37/3266H01J37/3414H01J37/3452
Inventor 刘飞邵伟韩民
Owner NANJING UNIV
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