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Micro-nano hot embossing device and method based on elastic template

A hot embossing equipment, micro-nano technology, applied in the directions of printing plate preparation, printing, printing presses, etc., can solve the problems of long preparation cycle, high cost, short service life of templates, etc., to achieve long service life, prolong life, production The effect of improving efficiency

Inactive Publication Date: 2019-06-14
MINNAN NORMAL UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Aiming at the deficiencies of the prior art, the present invention provides a micro-nano thermal embossing device and its method based on an elastic template, which solves the problem of long preparation period and high cost of the template on the existing micro-nano thermal embossing device, and the The problem of short service life

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  • Micro-nano hot embossing device and method based on elastic template
  • Micro-nano hot embossing device and method based on elastic template
  • Micro-nano hot embossing device and method based on elastic template

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Embodiment Construction

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0034] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial", The orientation or positional relationship indicated by "radial", "circumferential", etc. is based on the orientation or positional relationship shown in...

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Abstract

The invention discloses a micro-nano hot embossing device based on an elastic template and relates to the field of relevant technologies of micro-nano hot embossing. The device comprises a bottom plate; a microwave heater is disposed in the middle of the upper surface of the bottom plate; four supporting plates which are distributed rectangularly are disposed on the outer side of the microwave heater; and a heating plate is fixedly connected to the top ends of the supporting plates. The elastic template is limited through limiting plates and movable pieces, and thus a new template can replacethe old template whenever possible when the old template is damaged. The invention further discloses a micro-nano hot embossing process based on the elastic template. The process includes the following steps that A, a mother set is prepared; B, the elastic template is prepared; C, thermoplastic-material thin film is coated; D, micro-nano hot embossing is performed; and E, etching is performed. Bymeans of the micro-nano hot embossing device and method based on the elastic template, the advantages of low cost and capability of machining high-accuracy 3D micro-structures are achieved by the micro-nano hot embossing process and maintained, and the defects on the aspects of template service life, machining errors, yield, production efficiency and the like of the process are avoided.

Description

technical field [0001] The invention relates to the related technical field of micro-nano thermal embossing, in particular to a micro-nano thermal embossing device based on an elastic template and a method thereof. Background technique [0002] The core of the manufacturing of integrated circuits, MEMS (Micro-Electro-Mechanical System, micro-electromechanical systems) devices, diffractive optical elements (DOE–Diffractive Optical Elements), integrated optical communication devices, optical chips, and biochemical detection chips is to be able to Micro-nano-fabrication technology for micro- and nano-pattern processing on the substrate surface. [0003] At present, the most widely used micro-nano processing technology is ultraviolet lithography. Ultraviolet lithography transfers the pattern on the mask plate to the photosensitive material (photoresist) film on the substrate through photochemical reaction. Ultraviolet lithography requires the substrate to be absolutely flat, t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B41C1/14B41F19/02B41M1/12B41M1/30
Inventor 曾峻
Owner MINNAN NORMAL UNIV
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