Method for processing nanometer blind hole on surface of single silk through femtosecond laser

A femtosecond laser and surface processing technology, applied in the field of femtosecond laser applications, can solve the problems of natural silk micro-nano processing, small size and mechanical properties, and achieve high processing precision, simple process and good flexibility.

Active Publication Date: 2019-07-02
TSINGHUA UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the small size (~10 μm) and strong mechanical properties of silk itself, it is very difficult to directly micro-nano-process natural silk.

Method used

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  • Method for processing nanometer blind hole on surface of single silk through femtosecond laser

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] Adjust the neutral density attenuator 3, set the single pulse energy to 48.7nJ (4.34J / cm 2 , 1.13F th ); set the lens or microscope objective lens 8 as a 50× long working distance plan semi-apochromat lens (NA=0.5); through the electronically controlled shutter 4, control the number N of pulse sequences irradiated onto the silk 9 to be 350. Independent elliptical blind holes with a minor axis length of 74 nm were prepared on the silk 9 .

Embodiment 2

[0053] Adjust the neutral density attenuator 3, set the single pulse energy to 43.1nJ (3.84J / cm 2 , 1.07F th ); set the lens or microscope objective lens 8 to be a 50× long working distance plan semi-apochromat lens (NA=0.5); through the electronically controlled shutter 4, control the number N of pulse sequences irradiated onto the silk 9 to be 450. Independent elliptical blind holes with a minor axis length of 22 nm were prepared on the silk 9 .

Embodiment 3

[0055] Adjust the neutral density attenuator 3, set the single pulse energy to 40.1nJ (3.58J / cm 2 , 1.06F th ); set the lens or microscope objective lens 8 to be a 50× long working distance plan semi-apochromat lens (NA=0.5); through the electronically controlled shutter 4, control the number N of pulse sequences irradiated onto the silk 9 to be 650. Independent elliptical blind holes with a minor axis length of 66 nm were prepared on the silk 9 .

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Abstract

The invention provides a method for processing a nanometer blind hole on the surface of a single silk through a femtosecond laser, and belongs to the field of femtosecond laser application. The methodincludes the steps that firstly, a femtosecond laser pulse train is focused on the silk surface through a lens or a microscope objective lens, and by adjusting and controlling the number of femtosecond laser pulses incident on the silk surface, the energy flux and the polarization direction, the independently existing single elliptical nanometer blind hole is formed in the silk surface. The method is based on a principle of near field light modulation, the single nanometer blind hole far less than the diffraction limit is formed in the silk surface, compared with traditional methods, the advantages of high processing accuracy, flexibility and convenience are achieved, and a feasible method is provided for preparing a high sensitivity sensor.

Description

technical field [0001] The invention relates to a method for processing nanometer blind holes on the surface of a single silk by using a femtosecond laser, and belongs to the technical field of femtosecond laser applications. Background technique [0002] Silk is an ancient biological material, which has been used by humans for thousands of years together with natural materials such as cotton and animal fur. Due to its special structure and excellent mechanical properties, silk has important applications in the textile industry. In addition, because silk protein has excellent biocompatibility and has good optical transmission performance in the visible light band of 400nm-700nm, it can be used as a photoelectric sensor for biological monitoring. For example, silk has been used in dental bacteria sensors, edible fruit ripeness monitoring sensors, etc. [0003] The realization of the above-mentioned devices first needs to process the silk. At present, the processing method o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/382B82Y15/00B82Y40/00
CPCB23K26/382B82Y15/00B82Y40/00
Inventor 姜澜乔明闫剑锋
Owner TSINGHUA UNIV
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