Device and method for measuring optical constants and morphology parameters of thin films under high temperature loading

A technology of optical constants and measurement methods, applied in the field of optical measurement, can solve the problems of low maximum heating temperature, not considering oxidation phenomenon, difficult to meet measurement requirements, etc., to achieve the effect of heating temperature expansion, strong applicability and high flexibility

Active Publication Date: 2021-01-01
HUAZHONG UNIV OF SCI & TECH
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Problems solved by technology

This method directly ignores the deviation of ellipsometric parameters introduced by the quartz glass window, and does not consider the possible oxidation of the sample during the heating process, and the maximum heating temperature it can achieve is low, which is difficult to meet the requirements of material optics under common high-temperature loading conditions. Attribute Measurement Requirements

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  • Device and method for measuring optical constants and morphology parameters of thin films under high temperature loading
  • Device and method for measuring optical constants and morphology parameters of thin films under high temperature loading
  • Device and method for measuring optical constants and morphology parameters of thin films under high temperature loading

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[0043] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0044] Such as figure 1 Shown is a device for measuring optical constants and morphology parameters of thin films under high-temperature loading according to the present invention, which includes an optical constant measurement module and a high-temperature heating module. Wherein, the optical constant measurement module includes an incident optical path unit, a reflected optical path unit, and...

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Abstract

The invention belongs to the related technical field of optical measurement, and specifically discloses a device and a method for measuring an optical constant and a morphology parameters of a thin film under high temperature loading. The device comprises an optical constant measuring module and a high temperature heating module, wherein the high temperature heating module comprises a high temperature heating chamber, a quartz glass window, a high temperature heating stage, a high temperature stage controller and a gas flow channel unit, and the optical constant measuring module comprises an incident light path unit and a reflection light path unit. The method comprises the steps of: acquiring an actual ellipsometric parameter of a sample according to a calibrated ellipsometric parameter,and acquiring an optical constant and a morphology parameter of the sample according to an optical constant parametric model and a forward optical model of the sample. The device and the method can calibrate the ellipsometric parameter deviation introduced by means of the quartz glass window at different heating temperatures in a wide range of thermal temperatures, and construct a reductive measuring gas atmosphere, so that the device disclosed by the invention can measure to obtain the optical constant and the morphology parameter of the sample to be tested more precisely.

Description

technical field [0001] The invention belongs to the technical field of optical measurement, and more specifically relates to a device and method for measuring optical constants and shape parameters of thin films under high-temperature loading. Background technique [0002] The optical constant of a material at high temperature is an important physical parameter to measure the response characteristics of a material to high temperature loading. In view of the increasing application of materials under high-temperature loading conditions, such as the use of plasmonic structures in thermal fields, high-energy ultrashort pulse laser energy for target deposition, high-temperature sensing units made of fiber gratings, and engineering material design in the aerospace field Thermal radiation control devices, etc., and these application scenarios require the optical constant of the material when it is loaded at high temperature. In addition, using the high-temperature optical constant...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/25G05D23/20
CPCG01N21/25G05D23/20
Inventor 江浩刘佳敏刘世元洪琳谷洪刚
Owner HUAZHONG UNIV OF SCI & TECH
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