Graded porous oxide memristor shaped like melting hole
A hierarchical porous and porous silicon oxide technology, applied in the direction of instruments, static memory, digital memory information, etc., can solve problems such as limitations, memristor stability fluctuations, and limited applications
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[0032] The present invention will be further described in detail with reference to the embodiments of the accompanying drawings. The embodiments are intended to facilitate the understanding of the present invention. The specific structural details and functional details are only for the purpose of describing the exemplary embodiments and have no limiting effect on them. Accordingly, the invention can be embodied in many possible forms and the invention should not be construed as limited to re-presented example embodiments only, but should cover all changes, equivalents and alternatives falling within the scope of the invention.
[0033] In this embodiment, based on the "top electrode / oxide layer / bottom electrode" structure, such as figure 1 As shown, the structure has a top electrode layer 201, a first oxide layer 101, a second oxide layer 102, and a bottom electrode layer 202 from top to bottom.
[0034] The structure is prepared layer by layer on the substrate from bottom to...
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