Mask plate and mask plate manufacturing method
A mask and mask substrate technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of poor mask opening accuracy, reduce sag and improve tension. The effect of network accuracy and reduction of adverse effects
Active Publication Date: 2021-10-08
KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
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Problems solved by technology
[0003] In view of this, an embodiment of the present invention provides a mask and a method for preparing the mask to solve the problem of poor mesh stretching accuracy of the existing mask
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[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0028] As is well known, a mask plate includes an open area and a shielding area adjacent to the open area. In the actual preparation process of the mask, it is usually necessary to weld the mesh surface of the mask to the mask frame according to the position of the predetermined welding line. After the welding is completed, the buffer area is cut off along the edge of the welding line at a predetermined distance.
[0029] During the actual use o...
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The embodiment of the present invention mentions a mask and a method for preparing the mask, which solves the problem of poor mesh stretching accuracy of the existing mask. The mask plate includes an opening area, and the opening area includes an opening pattern; a shielding area adjacent to the opening area, and the shielding area includes a buffer pattern adapted to the opening pattern. The mask plate provided by the embodiment of the present invention achieves the purpose of buffering the sudden change in stress at the boundary line between the opening area and the shielding area by setting a set of buffer units corresponding to the set of opening units in the opening area in the shielding area, thereby ensuring Tension tension can be smoothly transmitted from the occlusion area to the opening area. In addition, the embodiment of the present invention can also reduce the quality of the mask plate by means of the set of buffer units in the shielding area, thereby reducing the adverse effect of the mask plate's own gravity on itself, and further reducing the sagging of the mask plate. Therefore, compared with the existing mask plate, the embodiments of the present invention can effectively improve the mesh stretching precision of the mask plate, thereby improving the yield rate of evaporation products.
Description
technical field [0001] The invention relates to the field of display technology, in particular to a mask and a method for preparing the mask. Background technique [0002] Organic light-emitting diode (Organic Light-Emitting Diode, OLED) display devices occupy an important position in the field of display technology due to their many advantages such as thinness, high brightness, low power consumption, and high definition. In the prior art, many structures (such as the cathode layer) in the OLED display device can be prepared by vapor deposition with the help of a mask. However, the opening precision of the existing mask plate is poor, which leads to a low product yield. Contents of the invention [0003] In view of this, the embodiments of the present invention provide a mask and a method for manufacturing the mask, so as to solve the problem of poor mesh stretching accuracy of the existing mask. [0004] In the first aspect, an embodiment of the present invention provid...
Claims
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IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24
Inventor 孙琳赵晶晶刘明星
Owner KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD