Optical device suitable for laser direct writing exposure equipment

An optical device and laser direct writing technology, applied in the field of optical systems, can solve problems such as low production capacity and processing, and achieve the effects of compact structure, simplified structure, and easy assembly and debugging.

Active Publication Date: 2019-11-19
俞庆平
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When processing small line widths, the production capacity is extremely low; when processing large line widths, there are no advantages in terms of production capacity and price compared to traditional machines

Method used

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  • Optical device suitable for laser direct writing exposure equipment
  • Optical device suitable for laser direct writing exposure equipment
  • Optical device suitable for laser direct writing exposure equipment

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Experimental program
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Embodiment Construction

[0021] The present invention will be further described below in conjunction with accompanying drawing:

[0022] Such as Figure 1-4 As shown, the optical device suitable for laser direct writing exposure equipment in this embodiment includes an MLA assembly 1, an adapter seat 2, a lens assembly 3 and a magnification adjustment assembly 4. The MLA assembly 1 is installed on one end of the adapter seat 2, and the The other end of the socket 2 is fixedly connected to one end of the lens assembly 3 , and the other end of the lens assembly 3 is fixedly connected to the magnification adjustment assembly 4 . Various lenses are installed in the lens assembly 3 .

[0023] The MLA component 1 includes an MLA chip 11 , a fixing device 12 for fixing the MLA chip 11 and a cooling device 13 for dissipating heat from the MLA chip 11 . In actual use, the structure and size of the fixing device 12 can be set according to the adapter seat 2 , and a compression ring 9 is provided between the he...

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PUM

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Abstract

The invention relates to an optical device suitable for laser direct writing exposure equipment. The device includes an MLA assembly, an adapter, a lens assembly and a magnification adjustment assembly; the MLA assembly is installed on one end of the adapter; the other end of the adapter is fixedly connected to one end of the lens assembly; the other end of the lens assembly is fixedly connected to the magnification adjustment assembly; and various lenses are installed in the lens assembly. The device simplifies the structures of original optical system assemblies, so that production costs canbe reduced, and compact structures and convenient assembling and debugging can be achieved.

Description

technical field [0001] The invention relates to the technical field of optical systems, in particular to an optical device suitable for laser direct writing exposure equipment. Background technique [0002] In the field of direct image transfer technology, there are two relatively traditional direct image transfer technologies, one is the direct image transfer technology of DMD, and the other is the direct image transfer technology of rotating prism. [0003] Direct image transfer technology with rotating prisms. This technology mainly uses single-point scanning technology, which is inferior to the DMD direct image transfer technology mentioned below in terms of production capacity, and its processing accuracy is better than that of DMD direct image transfer technology. This technology is a patented technology of the Israeli company Orbotech, which is mainly used in circuit board LDI and other products. [0004] Using DMD's direct image transfer technology. The core compo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2057G03F7/70291
Inventor 俞庆平
Owner 俞庆平
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