Etching device, etching system and etching method
An etching device and etching chamber technology, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of inconsistent etching rate, different etching rate, and enlargement, etc., and achieve the goal of reducing defects Probability, reduced risk of spatter, effect of increased etch rate
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[0046] The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the accompanying drawings. Apparently, the described embodiments are only part but not all of the embodiments of the present application. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of this application.
[0047] It should be noted that the terms used in the embodiments of the present application are only for the purpose of describing specific embodiments, rather than limiting the present application. The singular forms "a", "said" and "the" used in the embodiments of this application and the appended claims are also intended to include plural forms unless the context clearly indicates otherwise. It should also be understood that the term "and / or" as used herein refers to and includes any and all possible ...
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