Bubbling rinsing mechanism with rotating function

Abstract

The invention discloses a bubbling rinsing mechanism with a rotating function. The bubbling rinsing mechanism comprises a pool body and an electric air pump. A movable rod is arranged on the inner bottom of the pool body; a plurality of corrugated pipes are arranged on the peripheral outer wall of the movable rod; one end of each corrugated pipe is communicated with an inner wall cavity of the movable rod, and the other end of each corrugated pipe is provided with a stirring plate; a plurality of vertical nozzles are arranged on the upper surface of each stirring plate, and the vertical nozzles are uniformly distributed in the long axis direction of the stirring plate; a plurality of horizontal nozzles are arranged at the two sides of the stirring plate; each horizontal nozzle is internally provided with a first air valve; the horizontal nozzles are close to the tail end of the corresponding stirring plate; the output end of the electric air pump is provided with a second air conveyingpipe; the second air conveying pipe communicates with the cavity of the movable rod; and the air in the cavity can be exhausted through the vertical nozzles and the horizontal nozzles. When a mask plate in the pool body is rinsed, the air generated by the electric air pump can drive the stirring plates to rotate, so that it is guaranteed that bubbles can be generated in the pool body, and the cleaning effect on the mask plate is improved.

Description

technical field [0001] The invention relates to the technical field of mask plate cleaning, in particular to a bubbling rinsing mechanism with a rotating function. Background technique [0002] With the development of the semiconductor manufacturing process, the area of ​​the semiconductor chip is getting smaller and smaller, so the precision of the semiconductor process becomes more important. In the semiconductor manufacturing process, one of the important processes is photolithography, which is a process of transferring the pattern on the mask plate to the photolithographic pattern on the semiconductor. The mask plate used in mask exposure is usually coated with a layer of chromium on the quartz glass, and the required pattern is produced through the exposure etching process. The exposure experiment cannot be carried out after the mask plate is dirty, otherwise the dirty mark on it It will be transferred to the photoresist without reservation, therefore, the cleaning of ...

AI Technical Summary

Problems solved by technology

At present, the existing rinsing tank is laid with a gas pipe with a well-shaped structure, and a number of air holes are opened on the upper surface of the air pipe, and the gas is transported into the air pipe through an electric air pump, and the gas is discharged from the air holes to form bubbling, but there are rinsing tanks with this structure. The dead angle area makes it impossible to effectively remove foreign matter on the surface of the workpiece when rinsing the workpiece

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