Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask plate frame

A mask plate and frame technology, which is applied in the field of OLED preparation, can solve problems such as opening position deviation, evaporation position deviation, and affecting display effects, and achieve the effects of preventing deformation, ensuring product quality, and reducing the number of scrapped

Inactive Publication Date: 2019-12-20
KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

After welding, due to the welding stress, the metal mask will be deformed inwardly or outwardly, which will cause PPA (Pixel Position Accuracy) deviation of the pixel graphics on it; The opening position deviation of the stencil will also occur during the opening and use of the stencil, resulting in a deviation in the evaporation position, PPA deviation, and poor color mixing, which will affect the final display effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate frame
  • Mask plate frame
  • Mask plate frame

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] This embodiment discloses a mask frame, such as figure 1 As shown, it includes a frame body 1. The frame body 1 includes a plurality of frames connected end to end. The frame is provided with an arc-shaped rectification structure. The rectification structure extends along the length direction of the frame where it is located. The rectification structure is configured to be The frame body 1 provides prestressed deformation to correct the deformation of the mask.

[0031] In this embodiment, the frame body 1 is a square frame structure, including four frames connected end to end. Specifically, the mask frame provided by this embodiment can be applied to the situation where the full-page mask has been seriously shrunk or expanded. Such as figure 1 As shown, the rectification structure includes a pair of arc-shaped grooves 2 with opposite bending directions and prestressed ribs embedded in the arc-shaped grooves 2, and the arc-shaped grooves 2 extend along the length dire...

Embodiment 2

[0044] This embodiment provides a mask frame. The difference between the mask frame structure and the mask frame structure in Embodiment 1 is that the specific structure of the correction structure is different.

[0045] The mask plate frame provided in this embodiment is suitable for the production process of the mask plate frame before vacuum evaporation production. The mask plate frame can be adjusted in the subsequent vacuum evaporation process to prevent deformation of the mask plate, so as to improve the accuracy of pixel positions, thereby ensuring product quality.

[0046] Specifically, as figure 2 and image 3 As shown, the correction structure on the mask frame includes a pair of arc-shaped tunnels 3 with opposite bending directions, a correction steel bar 4 arranged in the arc-shaped tunnel 3, and an adjustment member 5 connected to both ends of the correction steel bar 4. The shaped hole 3 extends through the length direction of the frame where it is located, an...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of OLED preparing and discloses a mask plate frame. The mask plate frame comprises a frame body. The frame body comprises multiple frames which are sequentially connected end to end. Arc correction structures are arranged on the frames and extend in the length direction of the frames where the correction structures are located. The correction structurescan provide prestress deformation for the frame body so as to correct mask plate deformation, and therefore the deformation phenomenon that inner contraction or outer expansion already happens to mask plates is improved and corrected, the pixel position precision is improved, the mask plate scrap quantity is reduced, and cost is saved; and mask plate deformation can also be adjusted and preventedthrough the correction structures, and the product quality is ensured.

Description

technical field [0001] The invention relates to the technical field of OLED preparation, in particular to a mask plate frame. Background technique [0002] At present, the organic light-emitting diode (Organic Light-Emitting Diode, OLED) vacuum evaporation process uses a precision mask (Fine Metal Mask, referred to as FMM) frame module as a mold, and heats the organic light-emitting material to make it volatilize at a high temperature. The molecular state is evaporated to the relative position on the substrate through the opening of the mask, so that a solid film with a specific pattern is formed on the surface of the substrate, and the normal light emission of the pixels of the screen is realized. [0003] Generally, the mask frame module includes a mask frame and a metal mask with openings. Both ends of the metal mask are clamped by jaws, and then welded and fixed on the mask frame. After welding, due to the welding stress, the metal mask will be deformed inwardly or outw...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24C23C14/12
CPCC23C14/042C23C14/12C23C14/24
Inventor 姜正文李文星
Owner KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products