System and method for super-resolution full-field optical metrology on far-field nanometre scale
An optical metrology, nano-scale technology, applied in the field of super-resolution optical profilometry, which can solve problems such as the limitation of lateral resolution of optical profilometers
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[0050] Since these embodiments are non-limiting, variants of the invention are conceivable, in particular comprising only a selection of features described or exemplified below, in isolation from other features described or exemplified (even if this selection is incorporated in these other have been separated in the expression of features), as long as the selection of features is sufficient to confer technical advantages or distinguish the present invention from the prior art. The selection includes at least one feature, preferably a functional feature, which has no structural details and / or only has a part of the structural details, as long as this part is sufficient to confer a technical advantage or to distinguish it from the prior art.
[0051] Referring to FIG. 1 , variants of optical metrology systems operating in reflective configurations based on Michelson interferometer 1a, Twyman-Green interferometer 1b and Mirau interferometer 1c, respectively, and in a Mach-Zehnder ...
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