Preparation method of SE-PERC solar cell with high conversion efficiency
A solar cell, high-conversion technology, applied in the field of solar cells, can solve the problems of easy exposure of PN junction, decreased cell conversion efficiency, and easy damage to the oxide layer, and achieves good passivation effect, conversion efficiency improvement, and cost reduction treatment. Effect
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[0042] Example 1: A method for preparing SE-PERC solar cells with high conversion efficiency, including the following preparation steps:
[0043] 1) Texturing: Select 1000 P-type 1-3Ω·cm silicon wafers to use 7wt% hydrogen peroxide to remove impurities such as oil, and then texturing in 3wt% sodium hydroxide solution and 1wt% sodium silicate solution. The texture is formed on the surface of the silicon wafer; then 7% HF solution and 10% HCL solution are used to remove impurities such as metal ions, cleaned and dried; after texturing, the weight loss of the silicon wafer is 0.5g, and the reflectance of the silicon wafer is 11% ;
[0044] 2) Phosphorus diffusion: the silicon wafer after texturing is subjected to phosphorus diffusion treatment, the square resistance of the processed silicon wafer is 110Ω / □, and the junction depth is 50nm;
[0045] 3) Heavy laser doping: Use the Dier laser machine to perform heavy laser doping on the diffused silicon wafer, and the square resistance of ...
Example Embodiment
[0060] Embodiment 2: A method for preparing a SE-PERC solar cell with high conversion efficiency, including the following preparation steps:
[0061] 1) Texturing: Select 1000 P-type 1-3Ω·cm silicon wafers to use 15wt% hydrogen peroxide to remove impurities such as oil, and then texturing in 1wt% sodium hydroxide solution and 2wt% sodium silicate solution. The texture is formed on the surface of the silicon wafer; then 9% HF solution and 13% HCL solution are used to remove impurities such as metal ions, cleaned and dried; the weight loss of the silicon wafer after texturing is 0.7g, and the reflectance of the silicon wafer is 9% ;
[0062] 2) Phosphorus diffusion: the silicon wafer after texturing is subjected to phosphorus diffusion treatment, the square resistance of the processed silicon wafer is 90Ω / □, and the junction depth is 10nm;
[0063] 3) Heavy laser doping: Use the Dier laser machine to perform heavy laser doping on the diffused silicon wafer, and the square resistance o...
Example Embodiment
[0078] Embodiment 3: A method for preparing a SE-PERC solar cell with high conversion efficiency, including the following preparation steps:
[0079] 1) Texturing: Choose 1000 P-type 1-3Ω·cm silicon wafers to use 5wt% hydrogen peroxide to remove oil and other impurities, and then use 5wt% sodium hydroxide solution and 3wt% sodium benzoate solution for texturing. The surface of the silicon wafer is textured; then 5% HF solution and 20% HCL solution are used to remove impurities such as metal ions, cleaned and dried; after texturing, the weight loss of the silicon wafer is 0.4g, and the reflectivity of the silicon wafer is 12%;
[0080] 2) Phosphorus diffusion: the silicon wafer after texturing is subjected to phosphorus diffusion treatment, the square resistance of the processed silicon wafer is 130Ω / □, and the junction depth is 30nm;
[0081] 3) Heavy laser doping: Use the Dier laser machine to perform heavy laser doping on the diffused silicon wafer, and the square resistance of the...
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