Crystalline silicon measuring device based on binocular vision

Abstract

The invention belongs to the technical field of measurement monitoring, and especially relates to a crystalline silicon measuring device based on binocular vision. The crystalline silicon measuring device comprises a binocular vision measuring device, and a measuring method is provided. The binocular vision measuring device comprises a fixed connection module, a measurement monitoring module and acontrol module. The measurement monitoring module comprises a first camera and a second camera, one of the first camera and the second camera is fixed, and the other one of the first camera and the second camera can rotate for 360 degrees, the distance between the first camera and the second camera can be adjusted, the distance from the first camera and the second camera to crystalline silicon can be increased and decreased, by adjusting various shooting positions, averaging is performed on different positions of the images shot by the cameras, and a shooting result is calculated, a hole canbe formed at the upper end of a crystalline silicon reduction furnace, and the crystalline silicon measuring device is placed in the hole for monitoring the crystalline silicon, so that the arrangement work number of the crystalline silicon can be more accurately measured, the running speed and efficiency of the crystalline silicon can be improved, the working efficiency can be improved, and poisoning caused by human monitoring can be avoided.

Description

technical field [0001] The invention belongs to the technical field of measurement and monitoring, and in particular relates to a crystalline silicon measurement device based on binocular vision. Background technique [0002] Crystalline silicon polysilicon, polysilicon is gray or black equiaxed octahedral crystal with metallic luster, is the raw material for manufacturing single crystal silicon. Silicon is a semimetal and is an extremely important elemental semiconductor material. The production of polysilicon generally adopts the method of hydrogen reduction of trichlorosilane, except for the pyrolysis of silane in some factories. The trichlorosilane method includes two parts: the synthesis of trichlorosilane and the reduction of trichlorosilane. The synthesis of trichlorosilane uses metal silicon and hydrogen chloride as raw materials and reacts in a fluidized chlorination furnace. The boiling point of trichlorosilane is 31.5°C, which is quite different from the volatil...

AI Technical Summary

Problems solved by technology

The method of producing ultra-pure silicon by hydrogen reduction of trichlorosilane has a slow deposition rate, generally not exceeding 0.5mm / h

[0003] There are a large number of cylindrical crystalline silicon arranged in the existing crystalline silicon reduction furnace. Because the furnace body is sealed, it is impossible to see whether the cylindrical crystalline silicon is full or not, and it is impossible to determine when it can be transported out. It is inconvenient to use and cannot be monitored in real time.

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