A crystal silicon measurement device based on binocular vision

Abstract

The invention belongs to the technical field of measurement and monitoring, and in particular is a binocular vision-based crystalline silicon measurement device, including a binocular vision measurement device and a measurement method. The binocular vision measurement device includes a fixed connection module, a measurement monitoring module, and a control module , it is characterized in that: described measurement monitoring module comprises No. 1 camera, No. 2 camera, camera, wherein one is fixed, and the other can carry out 360 ° rotation, the adjustment of the distance between two cameras, two cameras zoom in and out away from the crystalline silicon The distance can be adjusted by adjusting a variety of camera positions, taking the average value of different positions of multiple cameras, and calculating the shooting results. A hole can be started at the upper end of the crystal silicon reduction furnace, and the present invention can be placed to monitor the crystal silicon, so that the crystal silicon can be monitored. The measurement of silicon arrangement work quantity is more accurate, which can improve the speed and efficiency of monitoring the operation of crystalline silicon, improve work efficiency, and prevent people from being poisoned when monitoring.

Description

technical field [0001] The invention belongs to the technical field of measurement and monitoring, and in particular relates to a crystalline silicon measurement device based on binocular vision. Background technique [0002] Crystalline silicon polysilicon, polysilicon is gray or black equiaxed octahedral crystal with metallic luster, is the raw material for manufacturing single crystal silicon. Silicon is a semimetal and is an extremely important elemental semiconductor material. The production of polysilicon generally adopts the method of hydrogen reduction of trichlorosilane, except for the pyrolysis of silane in some factories. The trichlorosilane method includes two parts: the synthesis of trichlorosilane and the reduction of trichlorosilane. The synthesis of trichlorosilane uses metal silicon and hydrogen chloride as raw materials and reacts in a fluidized chlorination furnace. The boiling point of trichlorosilane is 31.5°C, which is quite different from the volatil...

AI Technical Summary

Problems solved by technology

The method of producing ultra-pure silicon by hydrogen reduction of trichlorosilane has a slow deposition rate, generally not exceeding 0.5mm / h

[0003] There are a large number of cylindrical crystalline silicon arranged in the existing crystalline silicon reduction furnace. Because the furnace body is sealed, it is impossible to see whether the cylindrical crystalline silicon is full or not, and it is impossible to determine when it can be transported out. It is inconvenient to use and cannot be monitored in real time.

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