An organic light-emitting display backplane, its manufacturing method and display device
A light-emitting display, organic light-emitting layer technology, applied in the manufacture/processing of organic semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor devices, etc., can solve problems such as large IRDrop, reduce sheet resistance, avoid process difficulties, and reduce The effect of voltage drop
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Embodiment 1
[0088] Example 1: figure 1 The steps of the manufacturing method of the organic light-emitting display backplane shown are as follows:
[0089] (1) A planarization layer 9, an anode 2 and an inorganic insulating film 02 are sequentially formed on the base substrate 1 on which the thin film transistor (not shown) is formed, such as Figure 10A shown.
[0090] (2) The pixel defining layer 8 is formed on the inorganic insulating film 02, such as Figure 10B shown.
[0091] (3) Two layers of conductive films 03 and 04 are continuously deposited on the pixel defining layer 8, the material of the conductive film 03 is Mo, and the material of the conductive film 04 can be Al / Nd, such as Figure 10C shown.
[0092] (4) Apply photoresist 05 on the conductive film 04, such as Figure 10D shown.
[0093] (5) Select an etchant capable of etching Al / Nd to etch the conductive film 04 to form the pattern of the second auxiliary cathode 42, such as Figure 10E shown.
[0094] (6) Usin...
Embodiment 2
[0101] Embodiment 2: figure 2 The steps of the manufacturing method of the organic light-emitting display backplane shown are as follows:
[0102] (1) A planarization layer 9, a conductive thin film 03 and a conductive thin film 04 are sequentially formed on the base substrate 1 on which the thin film transistor (not shown) is formed. For example, the material of the conductive thin film 03 is Mo / Al / Nd (or Mo / Al), the material of the conductive film 04 is ITO, such as Figure 11A shown.
[0103] (2) Coat photoresist 05 on the conductive film 04 corresponding to the subsequently formed anode region and auxiliary cathode structure region, such as Figure 11B shown.
[0104] (3) Select the etching solution to etch the conductive film 04, form the pattern of the anode 2 in the pixel area, and simultaneously form the pattern of the second auxiliary cathode 42 in the non-pixel area, such as Figure 11C shown.
[0105] (4) Using the pattern of the anode 2 and the second auxili...
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