Vibration isolation device

An isolation device, vibration isolation technology, applied in vibration suppression adjustment, non-rotation vibration suppression, photolithography process exposure device, etc., can solve the problems of large vibration transmission attenuation, heat loss and so on

Active Publication Date: 2020-04-24
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
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Problems solved by technology

[0007] The vibration isolation device and its debugging method provided by the present invention are at least used to solve the problems of large vibration

Method used

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[0028] In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to specific embodiments and accompanying drawings.

[0029] see figure 1 , figure 1 A schematic diagram of the main structure of the EUV lithography vibration isolation device in the embodiment of the present invention is schematically shown. figure 1 The structure includes: a vacuum chamber 1, a main substrate 2 and two vibration isolation systems 3; the main substrate 2 and the vibration isolation system 3 are arranged on the inner wall of the vacuum chamber 1, and the vibration isolation system 3 is arranged on the vacuum chamber 1 and between the main substrates 2.

[0030] see figure 2 , figure 2 Schematically shows the first structural diagram of the vibration isolation device in the embodiment of the present invention; and refer to image 3 , image 3 A second structural diagra...

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Abstract

The invention provides a vibration isolation device. The vibration isolation device comprises a vacuum cavity (1); a main base plate (2) is arranged in the vacuum cavity (1); at least one vibration isolation system (3) is arranged between one inner wall of the vacuum cavity (1) and the main base plate (2); the vibration isolation system (3) comprises a permanent magnet (31), a coil frame (33), a main spring (34), a partition plate (35) and partition plate springs (36), wherein the coil frame (33) is provided with a coil (32); one end of the permanent magnet (31) is connected with the main baseplate (2); one end of the coil frame (33) is fixed on the partition plate (35); part of or the whole permanent magnet (31) is arranged in the coil frame (33); and the relative positions of the coil frame (33) and the permanent magnet (31) are adjustable; and the main base plate (2), the main spring (34), the partition plate (35), the partition plate springs (36) and the vacuum cavity (1) are connected with one another sequentially.

Description

technical field [0001] The invention relates to the field of extreme ultraviolet lithography vacuum vibration isolation, in particular to a vibration isolation device. Background technique [0002] With the development of large-scale integrated circuits, the exposure characteristic line width index puts forward higher and higher position stability requirements for the main substrate carrying the objective lens and optical precision measurement and control sensor. The random vibration from the ground and the disturbance caused by the high-speed movement of the silicon wafer table are one of the important factors affecting the positional stability of the main substrate. Therefore, it is necessary to provide a vibration-free isolation environment for the main substrate to ensure the normal operation of the objective lens and the measurement sensor. [0003] The extreme ultraviolet (extreme-ultraviolet, EUV) lithography with a wavelength of 13.5 nanometers is the highest level ...

Claims

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Application Information

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IPC IPC(8): F16F15/03F16F15/04G03F7/20
CPCF16F15/03F16F15/04F16F15/022G03F7/709G03F7/70883G03F7/70858
Inventor 陈进新李璟齐月静齐威徐天伟魏志国
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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