A vibration isolation device

A vibration isolation and isolation device technology, which is applied in vibration suppression adjustment, non-rotational vibration suppression, exposure device of photo-plate making process, etc., can solve problems such as heat loss, large vibration transmission attenuation, etc.

Active Publication Date: 2022-03-25
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The vibration isolation device and its debugging method provided by the present invention are at least used to solve the problems of large vibration transmission attenuation in vacuum and heat loss in vacuum by combining the principle of spring vibration isolation and electromagnetic vibration isolation.

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Embodiment Construction

[0028] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0029] refer to figure 1 , figure 1 A schematic diagram of the main structure of the extreme ultraviolet lithography vibration isolation device in the embodiment of the present invention is shown. figure 1 The structure includes: a vacuum chamber 1, a main substrate 2 and two vibration isolation systems 3; the main substrate 2 and the vibration isolation system 3 are arranged on the inner wall of the vacuum chamber 1, and the vibration isolation system 3 is arranged on the vacuum chamber 1 and the vibration isolation system 3. Between the main substrate 2.

[0030] refer to figure 2 , figure 2 It schematically shows the first structural diagram of the vibration isolation device in the embodiment of the present inven...

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Abstract

The invention provides a vibration isolation device, comprising: a vacuum cavity (1), a main substrate (2) inside the vacuum cavity (1), an inner wall of the vacuum cavity (1) and the main substrate (2) At least one vibration isolation system (3) is arranged between them; the vibration isolation system (3) includes: a permanent magnet (31), a coil frame (33) provided with a coil (32), a main spring (34), a partition (35) And the partition spring (36); one end of the permanent magnet (31) is connected to the main substrate (2), and one end of the coil frame (33) is fixed on the partition plate (35), and part or all of the permanent magnet (31) is placed on the coil frame (33) inside, the relative position between the bobbin (33) and the permanent magnet (31) is adjustable; The cavities (1) are connected sequentially.

Description

technical field [0001] The invention relates to the field of extreme ultraviolet lithography vacuum vibration isolation, in particular to a vibration isolation device. Background technique [0002] With the development of large-scale integrated circuits, the exposure characteristic line width index puts forward higher and higher position stability requirements for the main substrate carrying the objective lens and optical precision measurement and control sensor. The random vibration from the ground and the disturbance caused by the high-speed movement of the silicon wafer table are one of the important factors affecting the positional stability of the main substrate. Therefore, it is necessary to provide a vibration-free isolation environment for the main substrate to ensure the normal operation of the objective lens and the measurement sensor. [0003] The extreme ultraviolet (extreme-ultraviolet, EUV) lithography with a wavelength of 13.5 nanometers is the highest level ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F16F15/03F16F15/04G03F7/20
CPCF16F15/03F16F15/04F16F15/022G03F7/709G03F7/70883G03F7/70858
Inventor 陈进新李璟齐月静齐威徐天伟魏志国
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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