Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Plane target material burn-through alarm system

An alarm system and planar target technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of target waste, planar target damage, abnormal state of coating line, etc., to reduce production costs, The effect of protecting the target and reducing the waste of the target

Pending Publication Date: 2020-05-19
东莞南玻工程玻璃有限公司 +1
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this kind of estimation usually has a certain error. When the error is too large, either the target material is not used to the maximum, resulting in waste of target material, increasing production costs, or burning through the target material, resulting in damage to the planar target, water leakage or coating line The state is abnormal, therefore, the existing estimation method brings many problems to the production

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plane target material burn-through alarm system
  • Plane target material burn-through alarm system
  • Plane target material burn-through alarm system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] In order to describe the technical content, structural features, and achieved effects of the present invention in detail, the following will be described in detail in conjunction with the embodiments and accompanying drawings.

[0017] Such as figure 1 As shown, the planar target burn-through alarm system 100 of the present invention includes a magnetron sputtering planar target 1, a wire 2, an alarm 3 and a control system 4. The magnetron sputtering planar target 1 is provided with a planar target 11, The wire 2 is arranged on the bottom of the planar target 11 and the wire 2 is wrapped with an insulating layer, the wire 2 is electrically connected to the control system 4, and the control system 4 is electrically connected to the alarm 3 connect.

[0018] The number of the wires 2 is two, and they are arranged at the bottom of the etching track of the planar target 11 .

[0019] The control system 4 includes a processor 41 and an operating system 42 , the wire 2 is e...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a plane target material burn-through alarm system. The plane target material burn-through alarm system comprises a magnetron sputtering plane target, a lead, an alarm and a control system, wherein the magnetron sputtering plane target is provided with a plane target material, the lead is arranged at the bottom of the plane target material and wrapped with an insulating layer, the lead is electrically connected with the control system, and the control system is electrically connected with the alarm. The plane target material burn-through alarm system has the advantages that the target material can be used to the maximum extent, the waste of the target material is reduced, and the situation that the plane target material is burnt through and consequently the plane target is damaged is avoided.

Description

technical field [0001] The invention relates to a magnetron sputtering planar target, in particular to a planar target burn-through alarm system which maximizes the use of targets, reduces target waste, and avoids damage to the planar target due to target burn-through. Background technique [0002] In the coating production line, magnetron sputtering technology is often used. The working principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying to the substrate under the action of an electric field, so that they are ionized to produce positive ions and New electrons; new electrons fly to the substrate, and the positive ions are accelerated to the cathode target under the action of the electric field, and bombard the target surface with high energy, so that the target material is sputtered. Among the sputtered particles, neutral target atoms or The molecules are deposited on the substrate to form a thin film. [0003] In the produc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/54C23C14/35
CPCC23C14/54C23C14/35C23C14/3407
Inventor 杜彦廷李玉平曾明黄月勤余光辉艾发智
Owner 东莞南玻工程玻璃有限公司
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More