A light-emitting field effect transistor structure and preparation method based on poly f8bt crystal
A technology of field effect transistors and crystals, applied in the field of structure and preparation of light-emitting field effect transistors based on poly-F8BT crystals, can solve the problems of organic thin film transistor performance changes and poor coverage, and achieve fast directional transmission, improved coverage, and low The effect of turning on the voltage
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Embodiment 1
[0040] Step 1. Clean the transparent conductive glass substrate, the substrate used is ordinary transparent glass
[0041] Use transparent as the substrate to carry out chemical cleaning. The cleaning steps are as follows: first, the substrate is ultrasonically oscillated with detergent and deionized water for 20 minutes, and then the same method is used to clean it with deionized water, acetone, and isopropanol for 20 minutes. Finally blow dry with nitrogen.
[0042] Put the cleaned glass into Plasma and treat it with ultraviolet oxygen for 10 minutes.
[0043] Step 2. Fix the cleaned and dried substrate and the mask plate, and place the sample in the evaporation coating machine, and vacuumize it to as low as 6.0×10 -4Pa, deposit a 30nm aluminum electrode on the substrate at a speed of 0.3nm / s; then turn off the evaporation source and switch the evaporation channel, and wait for the vacuum to be as low as 6.0×10 -4 Pa, deposit 3nm zinc oxide on the aluminum electrode at a s...
Embodiment 2
[0051] Step 1. Clean the transparent conductive glass substrate, the substrate used is ordinary transparent glass
[0052] Use transparent as the substrate to carry out chemical cleaning. The cleaning steps are as follows: firstly, the substrate is ultrasonically oscillated with detergent and deionized water for 30 minutes, and then the same method is used to clean the substrate with deionized water, acetone, and isopropanol for 50 minutes. Finally blow dry with nitrogen.
[0053] Put the cleaned glass into the Plasma and treat it with ultraviolet oxygen for 20 minutes.
[0054] Step 2. Fix the cleaned and dried substrate and the mask plate, and place the sample in the evaporation coating machine, and vacuumize it to as low as 5.0×10 -4 Pa, deposit a 40nm aluminum electrode on the substrate at a speed of 0.4nm / s; then turn off the evaporation source and switch the evaporation channel, and wait for the vacuum to be as low as 5.0×10 -4 Pa, deposit 4nm zinc oxide on the aluminu...
Embodiment 3
[0061] Step 1. Clean the transparent conductive glass substrate, the substrate used is ordinary transparent glass
[0062] Use transparent as the substrate to carry out chemical cleaning. The cleaning steps are as follows: firstly, the substrate is ultrasonically oscillated with detergent and deionized water for 10 minutes, and then the same method is used to clean it with deionized water, acetone, and isopropanol for 60 minutes. Finally blow dry with nitrogen.
[0063] Put the cleaned glass into Plasma, and treat it with ultraviolet oxygen for 40 minutes.
[0064] Step 2. Fix the cleaned and dried substrate and the mask plate, and place the sample in the evaporation coating machine, and vacuumize it to as low as 7.0×10 -4 Pa, deposit a 50nm aluminum electrode on the substrate at a speed of 0.5nm / s; then turn off the evaporation source and switch the evaporation channel, and wait for the vacuum to be as low as 7.0×10 -4 Pa, deposit 5nm zinc oxide on the aluminum electrode at...
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