Method for processing exposure graphic data, exposure control unit and direct-writing exposure machine

A technology for exposure graphics and exposure control, applied in the field of exposure, can solve problems such as low production capacity and increased transmission time, and achieve the effects of increasing production capacity, increasing exposure speed, and saving transmission bandwidth

Active Publication Date: 2020-05-29
HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, due to the different complexity of the PCB circuit, the file size of the data of different PCB graphics is also

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for processing exposure graphic data, exposure control unit and direct-writing exposure machine
  • Method for processing exposure graphic data, exposure control unit and direct-writing exposure machine
  • Method for processing exposure graphic data, exposure control unit and direct-writing exposure machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] Embodiments of the present invention are described in detail below, and the embodiments described with reference to the drawings are exemplary, and embodiments of the present invention are described in detail below.

[0028] The direct writing exposure machine needs to segment the pattern data to be exposed (referred to as exposure pattern data in the embodiment of the present invention) to the exposure control unit to realize the transfer of the exposure pattern to the substrate, wherein the segmentation is for Support scanning while sending data to realize real-time exposure.

[0029] Such as figure 1 As shown, since the exposure control unit performs rotation transformation and other processing on the data during the exposure display, in the traditional implementation method, some data of the previous segment of data needs to be sent repeatedly before each segment of data to ensure the lossless seam of graphics processing, At the end of each piece of data, some grid...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a method for processing exposure graphic data, an exposure control unit and a direct-writing exposure machine. The method comprises the steps: a relocation step of responding toreading completion of a segment of data, and enabling an address pointer of the read data to be located at an address of repeated data needed by the next segment of data; a reading step of reading the required repeated data and the next segment of data from a first storage unit according to the address of the repeated data needed by the next segment of data and the address of the next segment ofdata; and the step of repeating the relocation step and the reading step till that each segment of data of the exposure graph data is obtained. According to the method for processing the exposure graphic data, the first storage unit is added to store the exposure data, and the required data is directly read from the first storage unit without being sent again during data processing so that a transmission bandwidth of the data is saved, transmission time is also saved, and productivity of the exposure machine is improved.

Description

technical field [0001] The invention relates to the field of exposure technology, in particular to a method for exposing graphic data, an exposure control unit and a direct writing exposure machine. Background technique [0002] Direct writing exposure machine is the key equipment in the production process of PCB (Printed Circuit Board, printed circuit board) and mask plate. In the process of PCB and mask plate production, production capacity is a concern of every manufacturer. Direct writing The type exposure machine saves the exposure machine to make film and other links, and directly transfers the exposure pattern to the exposure substrate through DMD (Digital Micromirror Device, digital micromirror) to increase the production capacity of PCB. [0003] However, due to the different complexity of the PCB circuit, the file size of the data of different PCB graphics is also different. For complex graphics data, the transmission time will increase accordingly, resulting in lo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/20
CPCG03F7/70383G03F7/70425G03F7/70483
Inventor 张玉喆
Owner HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap