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Wafer cleaning device

A technology for cleaning devices and wafers, used in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc. Effect

Inactive Publication Date: 2020-06-09
XIA TAI XIN SEMICON QING DAO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to prevent chemical substances from sputtering, baffles are usually used for shielding. However, these chemical substances are prone to problems such as chemical substances falling onto the wafer when they are attached to the baffle, which leads to a decrease in the yield of the wafer.

Method used

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Examples

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Embodiment Construction

[0027] The drawings show embodiments of the present invention. The present invention can be implemented in many different forms, and should not be interpreted as being limited to the embodiments set forth herein. On the contrary, these embodiments are provided to make the present invention more comprehensive and complete, and to enable those skilled in the art to fully understand the scope of the present invention. In order to be clearly visible, in the figure, the size of layers and regions have been enlarged.

[0028] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meanings as commonly understood by those of ordinary skill in the art described in the present invention. It should also be understood that terms such as those defined in general dictionaries should be interpreted as having meanings consistent with their meanings in the context of the relevant field, and should not be interpreted as excessively idealized or exc...

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PUM

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Abstract

The invention discloses a wafer cleaning device, which comprises a rotary room; a base, which is arranged in the rotary room; a rotary assembly, which is arranged on the base and is used to support awafer and drive the wafer to rotate; and a cleaning liquid recovery assembly, which comprises a first baffle element that is arranged around the rotary assembly and a heating device that is embedded in the first baffle element and is used to heat the first baffle element.

Description

Technical field [0001] The present invention relates to the technical field of semiconductors, in particular to a wafer cleaning device. Background technique [0002] Chemical substances are usually used in the cleaning process of wafers. When the wafer cleaning device is cleaning the wafers, as the rotating table rotates, the chemical substances will be sputtered around due to the centrifugal force and adhere to The inner wall of the rotating chamber. In order to prevent the sputtering of chemical substances, baffles are usually used to block them. However, these chemical substances adhere to the baffle and easily cause problems such as chemical substances falling on the wafer, which leads to a decrease in wafer yield. Summary of the invention [0003] In view of the above, it is necessary to provide a wafer cleaning device to quickly remove the chemical substances attached to the baffle. [0004] In order to solve the above-mentioned technical problems, the present invention pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B3/10B08B13/00H01L21/67
CPCB08B3/022B08B3/10B08B13/00H01L21/67051
Inventor 慎吉晟南昌铉吕寅准
Owner XIA TAI XIN SEMICON QING DAO LTD