Method for improving photoetching resolution based on space-time collaborative transformation exposure

Abstract

The invention discloses a method for improving photoetching resolution based on space-time collaborative transformation exposure. The invention relates to the field of DMD device imaging exposure. Themethod comprises the following steps: carrying out cooperative matching on three dynamic quantities including platform micro-movement, DMD graphic transformation and exposure energy adjustment to form a space-time collaborative transformation exposure mode for improving the photoetching resolution; a space-time collaborative transformation technology is applied to DMD projection photoetching; theedge smoothness of the photoetching pattern can be obviously improved under the condition of not reducing the size of the DMD micromirror or the magnifying power of the projection lens; a graph is quantified by using CAD, the sub-graph is extracted by using matlab, the micro-displacement of the piezoelectric platform is combined, and the exposure energy is controlled to carry out staggered superposition exposure on the sub-graph, so that the line width of the graph can be accurately controlled while the smoothness of the edge of the photoetching graph is improved.

Description

technical field [0001] The invention relates to the field of imaging exposure of DMD devices, in particular to a method for improving photolithography resolution based on time-space cooperative transformation exposure. Background technique [0002] The maskless lithography technology based on DMD can produce tiny, lightweight and integrated three-dimensional microstructure devices, which reduces the cost of lithography while improving the efficiency and precision of lithography. However, in the DMD maskless lithography system, by controlling the flipping of each micromirror, the projection lens is used to generate a dynamic mask image. Therefore, the resolution of the maskless lithography system is strictly limited by the size of the projected micromirror, and there is a non-integer pixel error, called DMD pixel quantization error, which will lead to a sawtooth structure on the edge of the written graphic outline. [0003] However, the existing technologies for improving th...

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Problems solved by technology

Therefore, the resolution of the maskless lithography system is strictly limited by the size of the projected micromirror, and there is a non-integer pixel error, called DMD pixel quantization error, which will lead to a sawtooth structure on the edge of the written graphic outline

[0003] However, the existing technologies for improving the resolution of lithography are relatively easy to implement for large depth of focus and low resolution lithography systems, but for systems with high resolution and small depth of focus, it is difficult to achieve real-time and rapid fine adjustment during motion. Focus, and when dealing with complex graphics, the amount of calculation is large, the system precision is low, and the operation is complicated

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