Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photosensitive resin composition, partition wall, organic electroluminescent element, image display device and lighting

A technology of photosensitive resin and composition, which is applied in the field of photosensitive resin composition and can solve the problems of reduced ink repellency of partition walls and the like

Pending Publication Date: 2020-08-21
MITSUBISHI CHEM CORP
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, after the formation of partition walls, UV cleaning treatment may be performed for the purpose of removing residues, etc., but there is a problem that although the residues are removed, the ink repellency of the partition walls is reduced.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive resin composition, partition wall, organic electroluminescent element, image display device and lighting
  • Photosensitive resin composition, partition wall, organic electroluminescent element, image display device and lighting
  • Photosensitive resin composition, partition wall, organic electroluminescent element, image display device and lighting

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0665] [1-3] Preparation method of photosensitive resin composition

[0666] The photosensitive resin composition of the present invention can be prepared by mixing the above-mentioned components with a mixer. In addition, you may perform filtration using a membrane filter etc. in order to make the prepared photosensitive resin composition uniform.

[0667] [2] Partition wall and method of forming partition wall

[0668] The photosensitive resin composition of the present invention can be used to form a partition wall, particularly a partition wall for partitioning an organic layer (light emitting portion) of an organic electroluminescent element. The partition wall of this invention is formed from the photosensitive resin composition of this invention.

[0669] The method of forming a partition using the photosensitive resin composition demonstrated above is not specifically limited, A conventionally well-known method can be employ|adopted. As a method for forming the part...

Embodiment

[0691] Hereinafter, although the photosensitive resin composition of this invention is demonstrated with reference to a specific Example, this invention is not limited to the following Example in the range which does not exceed the summary.

[0692] The constituent components of the photosensitive resin composition used in the following examples and comparative examples are as follows.

[0693] a-1: Acrylic resin (liquid repellent) synthesized in the following procedure

[0694] 55 parts by mass of propylene glycol monomethyl ether acetate as a solvent was added to a glass flask equipped with a stirring device, a thermometer, a cooling pipe, and a dropping device, and the temperature was raised to 105° C. while stirring under a nitrogen stream. Next, 20 parts by mass of compound (aa-1) containing a poly(perfluoroalkylene ether) chain having the chemical structure shown below, dissolved formaldehyde in 84.6 parts by mass of propylene glycol monomethyl ether acetate 50.1 parts ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
strengthaaaaaaaaaa
strengthaaaaaaaaaa
Login to View More

Abstract

Provided is a photosensitive resin composition which is capable of forming a partition wall that exhibits good ink repellency even after UV cleaning. A photosensitive resin composition according to the present invention contains (A) a liquid repellent agent, (B) an alkali-soluble resin, (C) a photopolymerizable compound, and (D) a photopolymerization initiator. The liquid repellent agent (A) contains an acrylic resin (a) that has a polycyclic saturated hydrocarbon skeleton and an ethylenic double bond. This photosensitive resin composition additionally contains (E) a chain transfer agent.

Description

technical field [0001] The present invention relates to a photosensitive resin composition, a partition wall composed of the photosensitive resin composition, an organic electroluminescence element including the partition wall, an image display device and lighting including the organic electroluminescence element. [0002] The entire contents of the specification, claims, and abstract of Japanese Patent Application No. 2018-011097 filed with the Japan Patent Office on January 26, 2018, and part or all of the contents disclosed in the documents cited in this specification are hereby cited, It is incorporated as the disclosure content of this specification. Background technique [0003] Conventionally, organic electroluminescent elements included in organic electroluminescent displays, organic electroluminescent lighting, etc. are manufactured by forming partition walls (dams) on a substrate and then laminating various functional layers in regions surrounded by the partition w...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004C08F2/48C08F290/00G03F7/027G03F7/029G03F7/032G03F7/038G09F9/30H01L27/32H01L51/50H05B33/12H05B33/22
CPCC08F2/48C08F290/00G03F7/004G03F7/027G03F7/029G03F7/032G03F7/038G09F9/30H05B33/12H05B33/22H10K59/00G03F7/105G03F7/028G03F7/033G03F7/2004G03F7/26G03F7/0007C08F265/06C08F220/32C08F220/301C08F2/50C08F222/10H10K59/122
Inventor 木村明日香中谷和裕
Owner MITSUBISHI CHEM CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com