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Ink repellent composition, negative photosensitive resin composition, cured film, partition wall, and optical element

A technology of photosensitive resin and composition, which is applied in the direction of optics, electrical components, electric solid devices, etc., can solve the problems of insufficient use of partition walls of organic EL components, etc., and achieve the effect of good UV/O3 resistance and easy formation

Active Publication Date: 2016-08-24
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, the UV / O resistance of ink repellents containing acrylic polymers 3 Low performance, insufficient as a partition wall for organic EL elements

Method used

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  • Ink repellent composition, negative photosensitive resin composition, cured film, partition wall, and optical element
  • Ink repellent composition, negative photosensitive resin composition, cured film, partition wall, and optical element
  • Ink repellent composition, negative photosensitive resin composition, cured film, partition wall, and optical element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0405] The present invention is explained based on examples, and the present invention is not limitedly interpreted by them. Examples 1-10, Example 14 and Example 15 are examples, and Examples 11-13 are comparative examples.

[0406] Each measurement was performed by the following method.

[0407] [Number average molecular weight (Mn) and mass average molecular weight (Mw)]

[0408]The number average molecular weight (Mn) and the mass average molecular weight (Mw) were measured by gel permeation chromatography using polystyrene as a standard substance. As the gel permeation chromatography, HPLC-8220GPC (manufactured by Tosoh Corporation) was used. As the column, a column obtained by connecting three Shodex LF-604 pieces was used. As a detector, an RI (Refractive Index, refractive index) detector is used. As a standard substance, EasiCal PS1 (manufactured by Polymer Laboratories) was used. Furthermore, when measuring the number average molecular weight and mass average mol...

Synthetic example 1

[0466] [Synthesis Example 1: Synthesis of Compound (CX-1)]

[0467] At 1,000cm equipped with a mixer 3 Put compound (cx-11) 14.5g, compound (cx-21) 32.9g, compound (cx-31) 21.9g, compound (cx-41) 21.9g, and compound (cx-51) 8.8g into a three-necked flask , to obtain a hydrolyzable silane compound mixture. Next, 320.2 g of PGMEA was thrown into this mixture to prepare a raw material solution.

[0468] 98.7 g of 1 mass % nitric acid aqueous solution was dripped at the obtained raw material solution. After completion of the dropwise addition, it was stirred at 40° C. for 5 hours to obtain a solution of compound (CX-1) (compound concentration: 10% by mass, hereinafter also referred to as (CX-1) solution.).

[0469] It should be noted that after the reaction was completed, the reaction solution was measured using a gas chromatograph, and it was confirmed that each compound used as a raw material was below the detection limit.

[0470] Table 1 shows the raw material composition ...

Synthetic example 2～6

[0471] [Synthesis Examples 2 to 6: Compounds (CX-2) to (CX-6)]

[0472] Except that the raw material composition was set as shown in Table 1, the same operation was performed as in Synthesis Example 1 to obtain solutions of compounds (CX-2) to (CX-6) (both compound concentrations: 10% by mass, and each solution was also hereinafter referred to as Called (CX-2) ~ (CX-6) liquid.).

[0473] Table 1 shows the evaluation results (number average molecular weight (Mn), mass average molecular weight (Mw), fluorine atom content, and ethylenic double bond content).

[0474] [Table 1]

[0475]

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Abstract

The present invention provides an ink repellent composition having good ink repellency and its UV / O3 resistance, a cured film which has good ink repellency on the upper surface and which can maintain its ink repellency well even after UV / O3 irradiation treatment, and partition walls, and provide an optical element capable of uniformly coating ink within a dot. An ink repellent composition comprising a first compound and a second compound, the first compound being a mixture comprising a first hydrolyzable silane compound having a fluoroalkylene group and / or a fluoroalkyl group and a hydrolyzable group The partial hydrolysis condensate of the second compound, the main chain of the second compound is a hydrocarbon chain and includes side chains with fluorine atoms, and the mass average molecular weight (Mw) is 1 million to 1 million.

Description

technical field [0001] The present invention relates to an ink repellent composition, a negative photosensitive resin composition, and a cured film, a partition, and an optical element using the negative photosensitive resin composition. Background technique [0002] For an organic EL (Electro-Luminescence, organic electroluminescence) element, there is a method of pattern-printing an organic layer such as a light-emitting layer by an inkjet (IJ) method. In the method, a partition wall is provided along the outline of dots, ink containing a material of a layer to be formed is injected into the interior thereof, dried and / or heated, etc., thereby forming a desired pattern film. [0003] In the above-mentioned method, in order to prevent ink color mixing between adjacent dots and apply ink uniformly within the dots, it is necessary that the upper surface of the partition wall has ink repellency and the side surface of the partition wall has ink affinity. [0004] The said par...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08L33/16C08G77/24C08L83/08G03F7/027G03F7/075H01L21/027H01L51/50H05B33/12H05B33/22
CPCG03F7/027C09D11/30C09D11/101C09D11/50G03F7/0046G03F7/038G03F7/0388G03F7/0757H10K71/135H10K71/236
Inventor 高桥秀幸松浦启吾川岛正行
Owner ASAHI GLASS CO LTD
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