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An adjusting component and a fine-tuning device

A technology for adjusting components and fine-tuning devices, which is applied in photolithography exposure devices, microlithography exposure equipment, instruments, etc., can solve the problems of poor stability and low adjustment accuracy, and achieve the effect of convenient installation and simple structure

Active Publication Date: 2021-11-23
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If you want to adjust the X and Y directions at the same time, you generally need to use a two-layer waist hole structure, and the adjustment accuracy is low and the stability is poor.

Method used

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  • An adjusting component and a fine-tuning device
  • An adjusting component and a fine-tuning device
  • An adjusting component and a fine-tuning device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] figure 1 A structural schematic diagram of a first viewing angle of a trimming device provided by the present invention. refer to figure 1 , the fine-tuning device can be used in a photolithography machine, wherein the fine-tuning device includes an adjustment base 1 , a detector 2 arranged on the adjustment base 1 , and an adjustment assembly capable of adjusting the position of the adjustment base 1 and thus the position of the detector 2 . In this embodiment, one detector 2 is located on one side of the adjustment base 1, and the other detector 2 is located on the other side of the adjustment base 1. The detection can be adjusted only by adjusting the movement or rotation of the adjustment base 1 on the XY plane. The position of device 2. Specifically, the fine-tuning device includes a plurality of adjustment components that can realize the movement of the adjustment base 1 in the three directions of X, Y, and Rz, and the position of the detector 2 thus adjusted is...

Embodiment 2

[0061] image 3 is a structural schematic diagram of another adjustment assembly provided in this embodiment. The adjustment assembly in this embodiment is basically the same as that in Embodiment 1. The difference between the two is that the second adjustment rod 34 abutting against the first adjustment rod 31 does not rotate under the action of the driving block, but moves linearly. move.

[0062] Specifically, the first adjusting rod 31 extends along the Z direction, and the driving block provided on the first adjusting rod 31 is actuated in a direction perpendicular to the axis, such as in the X direction. The second adjusting rod 34 can optionally extend along the X direction, and one end of the second adjusting rod 34 abuts against the driving block in the X direction, so that when the driving block is actuated in the X direction, the above-mentioned position of the second adjusting rod 34 is driven. One end moves linearly in the X direction. The other end of the seco...

Embodiment 3

[0071] Such as Figure 5 Shown is a structural schematic diagram of another adjustment assembly provided in this embodiment. The adjustment assembly in this embodiment is basically the same as that in Embodiment 2. The only difference between the two is that the driving block connected to the first adjustment rod 31 is an eccentric wheel. 32 ′, the eccentric wheel 32 ′ is fixedly connected with the first adjusting rod 31 , does not move along the axis of the first adjusting rod 31 , and rotates with the rotation of the first adjusting rod 31 . In addition, the installation hole for installing the adjustment assembly in the adjustment base 1 does not need to be provided with a moving passage for the drive block to move axially along the first adjustment rod 31, but a rotation channel for the eccentric wheel 32' to rotate around the first adjustment rod 31 needs to be provided. aisle. Correspondingly, one end of the second adjusting rod 34 for abutting against the driving block...

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Abstract

The invention discloses an adjustment component and a fine adjustment device, which belong to the technical field of precision machining and assembly. The adjustment assembly includes a fixed base plate, which is fixedly connected with the part to be adjusted; a first adjustment rod, which is connected with the fixed base plate, and a driving block is arranged on the first adjustment rod, and the first adjustment rod can drive the The driving block is actuated in a direction perpendicular to the axis of the first adjusting rod; one end of the second adjusting rod abuts against the driving block, and the other end abuts against a fixed reference. The fine-tuning device includes the above-mentioned adjusting component. The adjusting assembly of the present invention is provided with a first adjusting rod, a driving block, a second adjusting rod and a fixed bottom plate fixedly connected with the adjusting base, and the second adjusting rod applies a reaction force to the driving block by means of a fixed reference, thereby pushing the adjusting base The adjustment component has a simple structure and is easy to install, and the displacement along a certain direction can be realized without setting a waist-shaped hole.

Description

technical field [0001] The invention relates to the technical field of precision machining and assembly, in particular to an adjusting component and a fine-tuning device. Background technique [0002] In the mask transmission subsystem of the lithography machine, after the rough pre-alignment of the mask is completed, the exchange hand rotates 180° and transfers it to the mask table to eliminate the position deviation of the mask during the exchange process and ensure the mask The plate loading accuracy before the stencil is handed over to the plate exchange robot, and ensure the repeatability of the position of the mask plate to the mask table. [0003] Specifically, the detector reads the coverage of the light source to determine the position of the reticle mark, so as to compensate the position of the reticle through the mask table. When the detector judges the position deviation of the mask, the theoretical position of the mask must be set. Before the plate is loaded, t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/70741G03F7/70775G03F9/7003G03F9/7046
Inventor 宁诗琪王青亮郑锋标张阔峰郑教增姜杰郝凤龙庞飞
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD