Semiconductor process data correction method based on correlation entropy and deep neural network
A deep neural network and process data technology, applied in the field of semiconductor process data correction based on correlation entropy and deep neural network, can solve problems such as inappropriate correction results and failure to consider relationships, etc., to improve process performance and maintenance efficiency, reduce Disturbance of random and severe errors, effect of good correction results
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[0063] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be noted that the following embodiments are intended to facilitate the understanding of the present invention, but do not limit it in any way.
[0064] Taking the estimation of the deposition process results of a domestic factory as an example, the virtual measurement of the wafer height value through the multi-stage chemical process is carried out.
[0065] During production, the chemical vapor deposition process is similar to the process of applying solid thin film coatings on surfaces often used in the semiconductor industry. This process is complex because it involves many chemical reactions, and the reactors in a multi-reactor system are independently controlled to allow the film to be deposited in the process chamber under various conditions. Chemical vapor deposition equipment is equipped with a considerable number of sensors. Th...
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