Mask plate temperature control device and mask exposure device

A technology for temperature control device and mask, which is applied to exposure devices for photolithography, microlithography exposure equipment, optics, etc., can solve the problems of difficult temperature control of mask, low heat conduction and heat exchange efficiency, etc., and achieves improved temperature stability efficiency. , The effect of reducing the difficulty of temperature control

Active Publication Date: 2022-01-28
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the material of the mask plate is usually low-expansion quartz glass, and its heat conduction and heat transfer efficiency is low, which makes it difficult to control the temperature of the mask plate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate temperature control device and mask exposure device
  • Mask plate temperature control device and mask exposure device
  • Mask plate temperature control device and mask exposure device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0050] figure 1 It is a structural schematic diagram of a mask plate temperature control device provided by an embodiment of the present invention. refer to figure 1 , the mask plate temperature control device 10 includes: a gas delivery unit 110, a gas temperature control unit 120 and a mask storage unit 130; the gas delivery unit 110 is used to deliver gas bath gas to the mask storage unit 130, and the gas temperature control unit 120 is used The temperature variation range of the gas bath gas transferred from the gas delivery unit 110 to the mask storage unit 130 is adjusted to a preset temperature range; wherein, the mask storage unit 130 includes a frame main body 131 and a partition 132, and the partition 132 is fixed on In the frame main body 131 , an accommodating space is formed between two adjacent partitions 132 , and the accommodating space is used for placing a mask.

[0051] Wherein, the gas delivery unit 110 transmits the gas bath gas from the gas supply end t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
surface roughnessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a mask plate temperature control device and a mask exposure device. The mask plate temperature control device includes: a gas temperature control unit, a gas delivery unit, and a mask storage unit; the gas delivery unit is used to deliver gas bath gas to the mask storage unit, and the gas temperature control unit is used to The temperature variation range of the air bath gas transported by the gas delivery unit to the mask storage unit is adjusted to a preset temperature range; wherein, the mask storage unit includes a frame main body and a partition, and the partition is fixed on In the frame main body, an accommodating space is formed between two adjacent partitions, and the accommodating space is used for placing a mask. The technical scheme of the invention can reduce the difficulty of controlling the temperature of the mask plate.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of photolithography equipment, and in particular, to a mask plate temperature control device and a mask exposure device. Background technique [0002] With the development of semiconductor technology and the development of high-tech equipment in the direction of smallness, exquisiteness and complexity, higher requirements are placed on the line width of integrated circuits. Therefore, higher overlay resolution is required for lithography machines. However, the overlay resolution of a lithography machine is affected by factors such as mechanics, optics, temperature, and cleanliness. Small changes in the above factors may affect the overlay resolution of a lithography machine. [0003] In the overall structure of the lithography machine, the mask transfer module is the only module inside the lithography machine that realizes the transfer of the mask plate from the mask storage unit to the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70875G03F7/70741
Inventor 张明辉周剑锋郑锋标张帅
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap