Large-area cold plasma generation device and method based on mixed gas

A technology of cold plasma and mixed gas, applied in the field of plasma, can solve the problem that cold plasma is difficult to meet the requirements of uniformity and wide range of electron density conditions, and achieve a wide range of electron density conditions, good uniformity, and high electron density. Effect

Inactive Publication Date: 2020-11-17
YUNNAN POWER GRID CO LTD ELECTRIC POWER RES INST
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  • Application Information

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Problems solved by technology

[0005] The invention provides a large-area cold plasma generation device and method based on mixed gas to solve the technical problem that i

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  • Large-area cold plasma generation device and method based on mixed gas
  • Large-area cold plasma generation device and method based on mixed gas
  • Large-area cold plasma generation device and method based on mixed gas

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Embodiment Construction

[0039] In order to enable those skilled in the art to better understand the technical solutions in the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the scope of protection of this application.

[0040] figure 1 A schematic diagram of the basic structure of a large-area cold plasma generator based on a mixed gas provided by an embodiment of the present invention, figure 2 A photo of a discharge cavity provided for the embodiment of the present invention, below in conjunction with the attached figure 1 with figure 2 , to describe in detail ...

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Abstract

The invention provides a large-area cold plasma generation device and method based on mixed gas. The device comprises a discharge cavity, a gas inlet, a gas outlet, a mixed charging module, a vacuumizing module, electrodes and a high-voltage alternating-current power supply, the discharge cavity is of a cubic structure, and the gas inlet and the gas outlet are formed in the discharge cavity; the gas inlet is connected with the mixed charging module, and the gas outlet is connected with the vacuumizing module; the mixed charging module comprises a helium gas storage tank and an argon gas storage tank, and helium gas of the helium gas storage tank and argon gas of the argon gas storage tank are mixed at the gas inlet; and electrodes are oppositely arranged outside the shell of the dischargecavity and are connected with a high-voltage alternating-current power supply. Meanwhile, the advantages of high electron density of the argon plasma and good uniformity of the helium plasma are combined, the problems that the argon plasma is difficult to generate large-area uniform plasma and the electron density of the helium plasma is difficult to increase are avoided, and the large-area uniform plasma with a wide electron density condition range can be obtained.

Description

technical field [0001] The invention belongs to the field of plasma technology, and in particular relates to a large-area cold plasma generation device and method based on mixed gas. Background technique [0002] Surface dielectric barrier discharge can generate non-equilibrium plasma with high-energy electrons under normal pressure. It is currently used in surface modification of polymer materials, industrial ozone synthesis, high-efficiency ultraviolet lamps, large-area flat-panel plasma displays, environmental protection, Medical sterilization and clinical treatment have been widely researched and applied. [0003] The engineering application of plasma extension needs to generate large-area uniform plasma, and at the same time, it needs to control the selection range of reaction parameters of electron density. However, it is difficult to meet the requirements of uniformity and wide range of electron density conditions in a single gas medium. For example, for pure Ar dis...

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Application Information

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IPC IPC(8): H05H1/24
CPCH05H1/24H05H1/2406
Inventor 邓云坤赵虎王科李兴文赵现平彭晶焦琳赵海波周年荣
Owner YUNNAN POWER GRID CO LTD ELECTRIC POWER RES INST
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