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A preparation device and preparation process for electronic grade aluminum etching solution

A preparation device and aluminum etching technology, which is applied in the field of photosensitive chemistry, can solve problems such as high difficulty in coordination and control, suppression of production efficiency, and complex equipment structure, and achieve the effects of easy implementation, improved production efficiency, and simple operation of the preparation process

Active Publication Date: 2022-06-21
FUJIAN TIANFU ELECTRONIC MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The existing equipment for preparing electronic grade aluminum etchant has a relatively complex structure, and it is difficult to control the cooperation between various components. It is relatively cumbersome to use, and the production efficiency is inhibited to a certain extent.

Method used

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  • A preparation device and preparation process for electronic grade aluminum etching solution
  • A preparation device and preparation process for electronic grade aluminum etching solution
  • A preparation device and preparation process for electronic grade aluminum etching solution

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Please refer to figure 1 , this embodiment provides a preparation device 1000 for electronic grade aluminum etching solution.

[0046] The preparation device 1000 includes: a first storage tank 100 for storing raw material nitric acid, a second storage tank 200 for storing raw material phosphoric acid, a third storage tank 300 for storing raw material glacial acetic acid, a storage tank for storing raw material ultrapure water The fourth storage tank 400 , the mixing tank 500 , and the precision filter 600 .

[0047] Wherein, the first storage tank 100, the second storage tank 200, the third storage tank 300 and the fourth storage tank 400 are all selectively communicated with the mixing tank 500, and the outlet of the mixing tank 500 is communicated with the inlet of the precision filter 600 .

[0048] It should be noted that "selective communication" means that the opening (connection) time and closing (disconnection) time can be flexibly selected according to actua...

Embodiment 2

[0077] see Figures 7 to 10 , this embodiment provides a preparation device for electronic grade aluminum etchant. Compared with Embodiment 1, the difference is that the framework 710' of the precision filter of the preparation device provided by this embodiment further includes: a fourth extension leaf 712d.

[0078] The fourth extension leaf 712d is cylindrical and arranged coaxially with the central cylinder 711 , and the inner wall of the fourth extension leaf 712d is connected to an end of the third extension leaf 712c away from the second extension leaf 712b. Along the axial direction of the central cylinder 711 , the lengths of the central cylinder 711 , the first extension leaf 712 a , the second extension leaf 712 b , the third extension leaf 712 c and the fourth extension leaf 712 d are the same.

[0079]The fourth extension leaf 712d is provided with a notch 712d' for the filtrate to pass through, and the notch 712d' extends continuously along the circumference of ...

Embodiment 3

[0084] see Figures 11 to 14 , this embodiment provides a preparation device for electronic grade aluminum etchant. Compared with Embodiment 1, the difference is that the skeleton 710" of the fine filter of the preparation device provided by this embodiment further includes: a fourth extension leaf 712d.

[0085] The fourth extension leaf 712d is cylindrical and arranged coaxially with the central cylinder 711 , and the inner wall of the fourth extension leaf 712d is connected to an end of the third extension leaf 712c away from the second extension leaf 712b. Along the axial direction of the central cylinder 711 , the lengths of the central cylinder 711 , the first extension leaf 712 a , the second extension leaf 712 b , the third extension leaf 712 c and the fourth extension leaf 712 d are the same.

[0086] The fourth extension leaf 712d is provided with a notch 712d' for the filtrate to pass through. The notch 712d' extends along the circumference of the fourth extension ...

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Abstract

The invention relates to a preparation device and a preparation process for an electronic-grade aluminum etching solution, and relates to the technical field of photosensitive chemistry. The preparation device includes a first storage tank for storing raw material nitric acid, a second storage tank for storing raw material phosphoric acid, a third storage tank for storing raw material glacial acetic acid, a fourth storage tank for storing raw material ultrapure water, Mixing tank, and precision filter. The first storage tank, the second storage tank, the third storage tank and the fourth storage tank are selectively connected with the mixing tank, and the outlet of the mixing tank is connected with the inlet of the precision filter. Its structure is simple, realizes simplification, helps to simplify the production process and reduces the difficulty of operation, and has positive significance for improving production efficiency. The preparation process is realized based on the preparation device, and the operation is simple and easy to implement, so that the whole production process is more streamlined and the production efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of photosensitive chemistry, in particular, to a preparation device and a preparation process for an electronic-grade aluminum etching solution. Background technique [0002] The existing equipment for preparing electronic-grade aluminum etching solution has a complex structure, and the coordination and control of various components are also relatively difficult, which is relatively cumbersome to use, and the production efficiency is suppressed to a certain extent. [0003] In view of this, this application is hereby made. SUMMARY OF THE INVENTION [0004] The first object of the present invention is to provide a preparation device for electronic grade aluminum etching solution, which has a simple structure, realizes the reduction of complexity, helps to simplify the production process and reduces the difficulty of operation, and has the advantages of improving production efficiency. positive meaning. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/20B01F23/80B01F35/71
CPCC23F1/20B01F23/808B01F35/7164
Inventor 陈重佑吴全贵赖延恩陈国民艾合买提艾尔肯李文斌郑义达骆彦成任建业刘奕丰
Owner FUJIAN TIANFU ELECTRONIC MATERIAL CO LTD