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Spraying device in semiconductor cleaning equipment and semiconductor cleaning equipment

A technology of spraying device and cleaning equipment, which is applied in the field of semiconductor cleaning equipment and spraying device, which can solve the problems of complex overall structure, high cost and easy damage of the spraying device, and achieve the elimination of potential safety hazards, reduction of maintenance costs, and simplified structure Effect

Active Publication Date: 2020-12-15
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the spray device in the vertical quartz boat cleaning machine is generally driven by a motor to rotate, but in order to meet the sealing requirements of the process chamber, the overall structure of the spray device is relatively complicated, the cost is high, and it is easy to damage

Method used

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  • Spraying device in semiconductor cleaning equipment and semiconductor cleaning equipment
  • Spraying device in semiconductor cleaning equipment and semiconductor cleaning equipment
  • Spraying device in semiconductor cleaning equipment and semiconductor cleaning equipment

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Embodiment Construction

[0048] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0049] Existing semiconductor cleaning equipment usually uses corrosive liquids such as acid to spray and clean quartz tubes, quartz boats, and the process chamber of semiconductor cleaning equipment. The process chamber needs to be kept closed, and the spraying device is generally driven by a motor. rotate. Therefore, the sealing port of the process chamber (such as the chamber door) must increase the connection device for power supply to the motor and for detecting the motion state, etc., and it is also necessary to ensure the airtightness and ventilation and heat dissipation capabilities of the motor, which not only increases This increases the complexity of...

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Abstract

The invention provides a spraying device in semiconductor cleaning equipment. The spraying device comprises a rotating shaft, a substrate assembly and a spray pipe assembly. The rotating shaft is arranged in the substrate assembly and can rotate around its axis, and a flow guide pipeline is arranged in the rotating shaft; the substrate assembly is fixedly arranged on the top of a process chamber of the semiconductor cleaning equipment for accommodating the rotating shaft and further for guiding a cleaning agent into the flow guide pipeline; the spray pipe assembly is connected to the rotatingshaft and communicates to the flow guide pipeline; the spray pipe assembly comprises at least one driving spray pipe for driving the spray pipe assembly and the rotating shaft to rotate based on a generated counteraction force when the cleaning agent is sprayed. In the invention, it is only needed to drive the spray pipe to inject the cleaning agent to drive the rotating shaft to rotate automatically by means of a reverse action force of a spray head to spray and clean the process chamber rotatably. The spraying device is simple in structure and high in safety, and can save the maintenance cost of arranging a dynamic sealing member in the spraying device. The invention further provides the semiconductor cleaning equipment.

Description

technical field [0001] The invention relates to the field of semiconductor equipment, in particular to a spray device in semiconductor cleaning equipment and semiconductor cleaning equipment. Background technique [0002] With the improvement of integrated circuit (IC) integration, semiconductor devices also put forward higher requirements for semiconductor process equipment. Quartz tubes and quartz boats are commonly used parts in diffusion furnaces and vertical furnaces used for oxidation substrates (wafer). In the semiconductor process, quartz tubes and quartz boats are in direct contact with substrates, so the The particle size will directly affect the processing effect of the substrate in the oxidation and diffusion process. [0003] In order to improve the cleanliness of the surface of the quartz tube and the quartz boat, a washing machine is often used to clean the quartz tube and the quartz boat. At present, the cleaning equipment for cleaning quartz tubes and quar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08B08B9/02B08B9/093B08B13/00H01L21/67
CPCB08B9/02B08B9/0936B08B13/00B08B3/08H01L21/67051Y02P70/50
Inventor 马宏帅王锐廷张敬博赵宏宇
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD