Device and method for measuring Plasma temperature of winding coating machine

Abstract

The invention discloses a device and method for measuring the Plasma temperature of a winding coating machine. The method comprises the following steps of a, sequentially arranging an unwinding chamber, an unwinding roller shaft, an unwinding guide roller, a coating drum, a winding guide shaft and a winding roller shaft, wherein the coating drum is sleeved with a coating chamber, gas baffle platesare uniformly arranged in the coating chamber, a space between the coating chamber and the coating drum is divided into a plurality of coating cavities by the gas baffle plates, and a target materialis mounted in each coating cavity; b, arranging Mask baffle plates at the positions, close to the coating drum, of the two gas baffle plates and at the coating cavities, wherein thermocouples are evenly arranged on the Mask baffle plates; c, connecting the thermocouples with a thermodetector; d, vacuumizing the coating machine, and performing target opening operation when the vacuum reaches a required value; and e, setting different target position powers, simultaneously introducing argon, and obtaining the Plasma temperatures under different powers through the thermodetector. Compared with atemperature sensing paper testing method, the method is accurate and high in sensitivity; the Plasma temperature change condition within a certain period of time can be tested as required; and cost is low, and repeated use can be achieved.

Description

technical field [0001] The invention belongs to the technical field of large winding coating machines, and in particular relates to a Plasma temperature monitoring method and system for large winding coating machines. Background technique [0002] The method of industrially sputtering metals, alloys or compounds in vacuum to deposit them on the coated material is called vacuum coating method. Coating a layer of film on the surface of the material can make the material have many new physical and chemical properties. Magnetron sputtering technology is one of the important methods for preparing thin film materials. It uses charged particles to hit the sputtered substance after being accelerated by an electric field, which is what we usually call the target, and then sputters the target atoms to deposit them on the surface of the substrate at a certain speed, thereby forming a fixed film. [0003] The substrate temperature is an important factor determining the structure of th...

AI Technical Summary

Problems solved by technology

Although the measurement is very convenient, there are still defects such as insufficient sensitivity and inaccuracy

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