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Adamantane-polyphenol oligomer and its photoresist composition and application

A technology of oligomer and adamantane, which is applied in the field of adamantane-polyphenol oligomer and its photoresist composition, can solve the problems such as complex synthesis method, achieve simple synthesis process, improve etching resistance performance, and use raw materials simple effect

Active Publication Date: 2022-04-29
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The method of using side chain modification to improve the comprehensive performance of photoresist requires the synthesis of corresponding monomers, and then polymerizes to form corresponding polymers. Although this method can improve the etching resistance of photoresists, the synthesis method is relatively complex

Method used

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  • Adamantane-polyphenol oligomer and its photoresist composition and application
  • Adamantane-polyphenol oligomer and its photoresist composition and application
  • Adamantane-polyphenol oligomer and its photoresist composition and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0069] Preparation of adamantane-hydroquinone oligomers, the synthetic route is as follows:

[0070]

[0071] n=an integer from 4 to 20, E 1 for H or Indicates the connection key

[0072] Specific steps: Add 1,3-adamantanediol (16.8g, 100mmol, 1.0eq), hydroquinone (11.0g, 100mmol, 1.0eq.) and 180mL CF in a 250ml Schlenk reaction flask 3 COOH. The temperature of the reaction system was raised to 85°C and heated to reflux. A large amount of white solids appeared during the reaction, and the reaction time was 12 hours. After the reaction was completed, it was directly filtered to obtain a white solid. The solid was dissolved in 200 mL of ethyl acetate, washed with water until neutral, washed with saturated brine, dried over anhydrous sodium sulfate, filtered, and the filtrate was rotary evaporated under reduced pressure to obtain 23 g of a white solid with a yield of 89%. 1 H NMR (400MHz, (CD 3 ) 2SO) δ8.27~8.48 (m, phenolic hydroxyl group), 6.53 (m, benzene ring) 1....

Embodiment 2

[0074] Prepare the adamantane-hydroquinone oligomer protected by Boc anhydride, the synthetic route is as follows:

[0075]

[0076] In the formula, Boc represents E. 1 for H or Indicates the connection key, n=4~20 integers.

[0077] Specific steps are as follows:

[0078] Add adamantane-hydroquinone oligomer (23.0g, chain number: 94.2mmol, 1.0eq), Boc anhydride (di-tert-butyl dicarbonate) (79.1g, 282.6mmol, 3.0eq) into a 100mL three-necked flask .) and 120ml of dry tetrahydrofuran, stirring and dissolving under a nitrogen atmosphere, adding a catalytic amount of 4-N,N-dimethylaminopyridine (DMAP) (550mg, 4.5mmol, 0.05eq) to the solution to initiate the reaction, stirring at room temperature 24h. The reaction solution was extracted with ethyl acetate / water, the organic phase was washed three times with saturated aqueous sodium bisulfate solution and water respectively, dried over anhydrous magnesium sulfate, and the solvent was removed under reduced pressure to obt...

Embodiment 3

[0080] Preparation of adamantane-catechol oligomers, the synthetic route is as follows:

[0081]

[0082] n=an integer from 4 to 20, E 1 for H or Indicates the connection key

[0083] The specific steps are the same as in Example 1, except that hydroquinone is replaced with catechol, and the reaction yield is 82%. 1 HNMR (400MHz, (CD 3 ) 2 SO) δ8.57~8.32 (m, phenolic hydroxyl group), 6.61~6.75 (m, benzene ring) 1.57~2.33 (m, adamantane). MS (MALDI-TOF): test value m / z=1079.3 (M + , n=4,E 1 = H, the end is ), calculated value: C 70 h 78 o 10 m / z=1078.56 ([M] + ); test value m / z=1471.4 (M + , n=6,E 1 = H, E 2 =OH), calculated value: C 96 h 110 o 13 m / z= 1470.79([M] + ); test value m / z=1955.7 (M + , n=8,E 1 = H, E 2 =OH) Calculated value: C 128 h 146 o 17 m / z=1955.06 ([M] + ).

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Abstract

The invention provides an adamantane-polyphenol oligomer and a photoresist composition including the same. The synthesis process of the adamantane-polyphenol oligomer is simple, the raw materials are simple and easy to obtain, and the reaction can be completed in two steps. The product is obtained in high yield, the reaction intermediate is easy to separate, and the process is suitable for industrial production; the present invention directly uses adamantane and polyphenol as the building blocks of the oligomer, which maximizes the anti-etching performance of the oligomer, and at the same time Its thermal stability and film-forming property are increased, and its overall performance is greatly improved. The glass transition temperature of the oligomer is greater than 100°C, which is suitable for the requirements of photolithography processing technology, and has good performance in various polar solvents. Solubility helps it to adapt to the requirements of film thickness in different photolithography technologies, and expands the scope of application.

Description

technical field [0001] The invention belongs to the technical field of materials, and in particular relates to a class of adamantane-polyphenol oligomers and photoresist compositions and applications thereof. Background technique [0002] Photoresist, also known as photoresist, is a kind of etching-resistant thin film material whose solubility changes after energy radiation such as beam, electron beam, ion beam or x-ray, and is widely used in integrated circuits and semiconductor discrete devices. microfabrication. By coating photoresist on the surface of semiconductor, conductor or insulator, the part left after exposure and development can protect the bottom layer, and then use etchant to etch to transfer the required micro-pattern from the mask to the substrate. Therefore, photoresist is a key material in device microfabrication technology. With the rapid development of the semiconductor industry, photolithography technology has put forward higher requirements for the c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G61/02G03F7/038G03F7/039C07C39/17C07C69/96C07D309/12C07C37/16C07C68/00C07C68/06
CPCC08G61/02G03F7/038G03F7/039C07C39/17C07C69/96C07D309/12C08G2261/124C08G2261/1422C08G2261/226C08G2261/312C08G2261/3325C07C2603/74C07C2602/20
Inventor 李嫕胡盛文陈金平于天君曾毅
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI