Measurement Method of Time-varying Plasma Electron Density Jitter Frequency

A plasma and electron density technology, applied in the direction of plasma, electrical components, etc., can solve the problems of time-consuming, measurement efficiency that cannot satisfy the analysis of plasma dynamic characteristics, and the inability to obtain the jitter frequency of plasma electron density in a single measurement.
CN112153796BActive Publication Date: 2021-07-20XIDIAN UNIV
0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
XIDIAN UNIV
Publication Date
2021-07-20

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention discloses a method for measuring the jitter frequency of time-varying plasma electron density, which solves the problem that the existing measurement method cannot obtain the jitter frequency of the electron density by single measurement. The implementation includes: transmitting the linear frequency modulation signal to obtain the reflection signal of the time-varying plasma; calculating the one-dimensional range image of the echo to confirm the peak expansion phenomenon; calculating the time-varying plasma electron density jitter frequency through the jitter frequency calculation formula. The invention is also an application of a time-varying plasma electron density jitter frequency measurement method, which can be used to calculate the distribution of plasma electron density jitter frequency in time and space, and the plasma interference compensation parameters in the reentry spacecraft communication system. The invention calculates the electron density jitter frequency back by measuring the peak extension distance in the one-dimensional range image, obtains a simple and effective jitter frequency measurement method, and provides a measurement method for the plasma electron density dynamic parameters in the ground plasma experiment.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention belongs to the field of plasma parameter measurement, and mainly relates to the measurement of plasma dynamic parameters, in particular to a method for measuring the jitter frequency of time-varying plasma electron density, which can be used to measure the dynamic characteristics of time-varying plasma. Background technique

[0002] During the return phase of the re-entry spacecraft, the speed can reach tens of Machs. The surface of the spacecraft and the atmosphere will have a strong interaction, forming a shock wave at the head of the spacecraft. The temperature and pressure of the gas will increase sharply, ionizing the atmosphere, and the surface of the spacecraft will be A layer of plasma is generated, and the plasma will seriously interfere with the spacecraft's sending and receiving signals, affecting the communication between the ground and the spacecraft. During the return process of the spacecraft, atmospheric turbulence will ca...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More