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Inclination protection device for wafer chamfering

A protection device and chamfering technology, which is applied to fine working devices, measuring devices, measuring inclination, etc., can solve problems such as wafer damage, wafer chamfering, and large inertia

Inactive Publication Date: 2021-02-02
广州蓝涛贸易有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies of the prior art, the present invention provides a tilt protection device for wafer chamfering, which is capable of automatically detecting the tilt angle of the wafer disc, and automatically shutting off the output source of the wafer disc when the tilt exceeds a predetermined value The advantage is that the chamfering disc generates a large inertia during the rotation process. Therefore, the chamfering disc will increase the inclination angle according to the inertia, and the excessive inclination angle will cause excessive chamfering of the wafer. Problems causing wafer damage

Method used

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  • Inclination protection device for wafer chamfering
  • Inclination protection device for wafer chamfering
  • Inclination protection device for wafer chamfering

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Embodiment Construction

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0028] see Figure 1-7 , a tilt protection device for wafer chamfering, including a detection column 1, the bottom of the detection column 1 is fixedly connected with a liquid storage column 2, the liquid storage column 2 and the hydraulic column 21 communicate with each other, and the interior of the liquid storage column 2 is filled There is liquid water, by setting the liquid water, the liquid water in the liquid storage column 2 will follow the tilt due to...

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Abstract

The invention relates to the technical field of semiconductor processing equipment, and discloses an inclination protection device for wafer chamfering. The inclination protection device comprises a detection column, wherein the bottom of the detection column is fixedly connected with a liquid storage column, the inner side wall of the detection column is fixedly connected with a hydraulic column,the inner side wall of the hydraulic column is slidably connected with an ejector rod, the top end of the ejector rod is fixedly connected with a permanent magnet I, and the top end of the permanentmagnet I is fixedly connected with a reset spring I; and a sliding block in a detection bracket is driven by a cross rod to move inwards, and when the sliding block moves inwards, a connecting rod onthe sliding block moves along with the sliding block, the connecting rod drives an elastic piece to deform upwards, a contact on the elastic piece is in contact with a transmission line on a conductive platform, an alarm on the outer side of the detection column gives an alarm after being electrified, so that a person is reminded of an overlarge inclination angle, the device can automatically detect the inclination angle, and the use reliability of the device is improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor processing equipment, in particular to a tilt protection device for wafer chamfering. Background technique [0002] Wafer refers to the silicon chip used in the manufacture of silicon semiconductor integrated circuits. Because of its circular shape, it is called wafer. Wafer is the carrier used in the production of integrated circuits. In general, wafers refer to single crystal silicon wafers. Monocrystalline silicon wafers are drawn and refined from ordinary silica sand. After a series of measures such as dissolution, purification and distillation, they are made into single crystal silicon rods. After the single crystal silicon rods are polished and sliced, they become round crystals. The mechanical strength of the edge surface and the reduction of particle contamination usually require chamfering. [0003] In the prior art, in order to make the chamfering of the wafer chamfering more smo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B28D5/02B28D7/00H01L21/67G01C9/18G08B21/18
CPCB28D5/0058B28D5/0064B28D5/022G01C9/18G01C2009/187G08B21/18H01L21/67092H01L21/67253
Inventor 彭付萍
Owner 广州蓝涛贸易有限公司
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