Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wafer powder wiping machine and powder wiping mechanism thereof

A technology of wafers and powder bins, which is applied in the manufacture of electrical components, semiconductor/solid-state devices, circuits, etc., can solve problems such as explosions and fires in dust floating operation workshops, differences in the cleanliness of glass dusting, and hidden dangers to the health of operators. Achieve the effect of simple structure, reasonable design and good powder wiping effect

Inactive Publication Date: 2021-02-12
SICHUAN HONGXINWEI TECH
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] GPP (Glassivation Passivation Parts) diode chip, that is, glass passivation diode chip, is based on the existing ordinary silicon rectifier diffusion sheet, and a layer of glass is sintered around the P / N junction surface of the tube core to be divided, so that the P / N The N-junction is best protected from the intrusion of the external environment and the stability of the diode chip is improved. After the GPP diode chip is sintered with a layer of glass on its P / N junction surface, the glass needs to be passivated. Before the passivation treatment, the glass powder on the glass surface needs to be wiped off, otherwise the passivation effect of the glass will be seriously affected, and the performance of the diode chip will be deteriorated
[0003] At present, the powder wiping operation before glass passivation of GPP diode chips is manual dusting, as described in Chinese patent application CN201611183968.8, using an eraser to gently and flatly wipe off the glass powder by hand, but manual dusting is done by hand after all. To achieve this, the dusting objects are fragile products such as glass, and the dusting strength of each worker is different during the operation process. Correspondingly, there are also differences in the cleanliness of the glass dusting, which makes the yield of the product unsatisfactory. It is well controlled, and the manual dusting operation can easily lead to an increase in the scrap rate of diode chip production
In addition, the efficiency of manual dusting operation is low, which cannot meet the increasing demand for GPP diode chips, and completing the powdering process by manual operation will also lead to an increase in the production cost of GPP diode chips, which will eventually reduce the production cost of GPP diode chips. Advantages in price
In addition, the manual dusting operation requires a lot of materials, the processing steps are complicated, the protection measures are simple, and the operating space cannot be 100% closed. Glass dust is very easy to float and spread outward, causing dust pollution to the surrounding environment. The dust pollution will It will cause health hazards to operators, and will also enter the diode chip production equipment to affect the normal operation of the equipment; dust floating will also bring safety hazards of explosion and fire to the operation workshop

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wafer powder wiping machine and powder wiping mechanism thereof
  • Wafer powder wiping machine and powder wiping mechanism thereof
  • Wafer powder wiping machine and powder wiping mechanism thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] The present embodiment provides a powder wiping mechanism 1 of a wafer duster, comprising a planetary gear set 11 and a strong magnet for connecting special filter paper for dust wiping, and the strong magnet is arranged on the lower end surface of the planetary gear set 11; planetary gears are used The group 11 is used as a transmission mechanism, and a strong magnet is installed on the lower end of the planetary gear set 11 to connect the special filter paper for powder wiping, so that both parts of the special filter paper for dust wiping can realize the revolution around the center, and at the same time, some parts can realize the center around itself Self-rotation makes the powder rubbing effect better.

[0031] In this embodiment, the planetary gear set 11 includes a top plate 111, a bottom plate 112, a driving gear 113 and several planetary sets 114 that are sheathed in sequence. Group 114 includes several planetary gears 114a and ring gear 114b, and several plan...

Embodiment 2

[0038] This embodiment provides a wafer wiper, including a wiper chamber 2 and a wiper mechanism 1 of the wafer wiper provided in Embodiment 1, and the wiper mechanism 1 is installed in the wiper chamber 2 . Specifically, an observation door is provided on one side of the powder wiping bin 2, and a dust collection tank is provided below the observation door.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a wafer powder wiping machine and a powder wiping mechanism thereof, and belongs to the technical field of semiconductor element manufacturing equipment. The wafer powder wipingmachine comprises a planetary gear set and a strong magnet used for connecting filter paper special for powder wiping; the strong magnet is arranged on the lower end surface of the planetary gear set, and the planetary gear set is used as a transmission mechanism; a strong magnet used for being connected with filter paper special for wiping powder is arranged on the lower end face of the planetary gear set, so that part of the filter paper special for wiping powder can revolve around the center and part of the filter paper can rotate around the center of the filter paper, and the powder wiping effect is better.

Description

technical field [0001] The present application relates to the technical field of semiconductor element manufacturing equipment, in particular, to a wafer wiper and its wiper mechanism. Background technique [0002] GPP (Glassivation Passivation Parts) diode chip, that is, glass passivation diode chip, is based on the existing ordinary silicon rectifier diffusion sheet, and a layer of glass is sintered around the P / N junction surface of the tube core to be divided, so that the P / N The N-junction is best protected from the intrusion of the external environment and the stability of the diode chip is improved. After the GPP diode chip is sintered with a layer of glass on its P / N junction surface, the glass needs to be passivated. Before the passivation treatment, the glass powder on the surface of the glass needs to be wiped off, otherwise the passivation effect of the glass will be seriously affected and the performance of the diode chip will deteriorate. [0003] At present, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/329
CPCH01L21/67011H01L29/66136
Inventor 李健儿李学良马晓洁唐毅谢雷敬毅
Owner SICHUAN HONGXINWEI TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products