Chemical agent, kit, pattern forming method, method for producing chemical agent and chemical agent containing body
A kit and liquid medicine technology, applied in the photolithographic process of pattern surface, preparation of detergent mixture composition, chemical instruments and methods, etc., can solve the problems of semiconductor device manufacturing yield reduction, short circuit abnormality, etc.
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[0895] Hereinafter, the present invention will be described in more detail based on examples. Materials, usage amounts, ratios, processing contents, processing procedures, and the like shown in the following examples can be appropriately changed without departing from the gist of the present invention. Therefore, the scope of the present invention should not be limitedly interpreted by the Examples shown below.
[0896] In addition, when preparing the chemical solutions of Examples and Comparative Examples, the handling of the container, preparation, filling, storage, and analysis and measurement of the chemical solutions were all carried out in a clean room satisfying ISO class 2 or 1. In order to improve the measurement accuracy, in the measurement of the content of organic compounds and the measurement of the content of metal components, when the measurement of components below the detection limit is carried out by normal measurement, the chemical solution is concentrated a...
Synthetic example 1
[0969] (Synthesis Example 1) Synthesis of Resin (A-1)
[0970] 600 g of cyclohexanone was placed in a 2L flask, and nitrogen substitution was performed at a flow rate of 100 mL / min for one hour. Then, 4.60 g (0.02 mol) of polymerization initiator V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) was added, and it heated up until internal temperature became 80 degreeC. Next, 4.60 g (0.02 mol) of the following monomers and a polymerization initiator V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) were dissolved in 200 g of cyclohexanone to prepare a monomer solution. The monomer solution was added dropwise to the above flask heated to 80°C over 6 hours. After completion of the dropwise addition, it was further reacted at 80° C. for 2 hours.
[0971] 4-Acetoxystyrene 48.66g (0.3mol)
[0972] 1-ethylcyclopentyl methacrylate 109.4g (0.6mol)
[0973] Monomer 1 22.2g (0.1mol)
[0974] [chemical formula 39]
[0975]
[0976] The reaction solution was coo...
Embodiment X1
[1017] The above-mentioned chemical solution B1 was prepared as the chemical solution X as the developer.
[1018] In addition, butyl butyrate was prepared as the chemical liquid Y as the rinse liquid. Here, the butyl butyrate used as the chemical solution Y was not subjected to the above-mentioned filtration treatment and the like, but a purchased product was used as it was.
[1019] In addition, the organic solvent used as the chemical liquid Y used in the following examples and comparative examples was not subjected to the above-mentioned filtration treatment, and purchased ones were used as they were.
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