Rapid polishing and grinding equipment for circular semiconductor materials

A semiconductor and fast technology, applied in grinding/polishing equipment, metal processing equipment, grinding machines, etc., can solve the problems of difficult cleaning and maintenance, long feeding time, and low grinding efficiency, so as to save the time of repeated feeding and improve Work efficiency, convenient grinding and polishing effect

Inactive Publication Date: 2021-03-02
广州创春商贸有限公司
View PDF8 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Polishing is required in the production process of semiconductor materials, but the existing polishing equipment, the blanking and polishing process is carried out step by step, requiring two sets of equipment to cooperate to complete, the equipment structure is complex, and it lacks dust treatment devices, which is not easy to clean and maintain , long feeding time, waste of time and low grinding efficiency

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Rapid polishing and grinding equipment for circular semiconductor materials
  • Rapid polishing and grinding equipment for circular semiconductor materials
  • Rapid polishing and grinding equipment for circular semiconductor materials

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0023] see Figure 1-5 , a kind of circular semiconductor material rapid polishing equipment, comprising a fixed frame 1, a workbench 2 is movably connected above the fixed frame 1, a rotating motor is arranged under the workbench 2, and a dust suction fan and a dust suction fan are arranged on both sides of the rotating motor Debris recovery device, at the same time, the workbench 2 is equipped with a fixed clamping device, the top of the workbe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the technical field of semiconductor materials, and discloses rapid polishing and grinding equipment for circular semiconductor materials. The equipment comprises a fixing frame; a workbench is movably connected with the upper portion of the fixing frame; and a rotating wheel is movably connected with the upper portion of the workbench. Four clamping jaws can fixedly clampand release the circular materials through the cooperation of an ejecting rod, pushing plates, a push rod, a hinge rod, a toothed plate, a positioning gear, and a transmission gear; when the push rodcontinues to descend, the materials can be pressed on the workbench through an arc-shaped pressing block, so that grinding and polishing are facilitated; the polishing and grinding process and the feeding process can be conducted at the same time through the action of the upper set of push plates, the lower set of push plates and the push rod; and through the cooperation of an electromagnetic push block, a moving rod and a clamping block, a ratchet wheel can drive the ejecting rod or the whole rotating wheel to rotate together, so that the switching of the upper set of clamping jaws and the lower set of clamping jaws is facilitated, the repeated feeding time in the polishing and grinding process is saved, the working efficiency is improved, and the practicability of the equipment is further improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor materials, in particular to a circular semiconductor material rapid polishing equipment. Background technique [0002] Semiconductors refer to materials whose conductivity is between conductors and insulators at room temperature. Semiconductor materials are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high-power power conversion and other fields. Most electronic products, such as The core units in computers, mobile phones or digital recorders are all closely related to semiconductors. [0003] Polishing is required in the production process of semiconductor materials, but the existing polishing equipment, the blanking and polishing process is carried out step by step, requiring two sets of equipment to cooperate to complete, the equipment structure is complex, and it lacks dust treatment devices, which is not easy to clean...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B19/22B24B41/00B24B41/02B24B41/06B24B47/12B24B47/22
CPCB24B19/22B24B41/005B24B41/02B24B41/06B24B47/12B24B47/22
Inventor 郭思敏
Owner 广州创春商贸有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products