Mark for monitoring opening precision of shading sheet of photoetching machine and using method of mark

A light-shielding sheet and lithography machine technology, which is applied in the semiconductor field, can solve problems such as the impact of cutting lines or WAT test points, and achieve the effects of automatic processing, saving manpower and machine time, and preventing light shading or light leakage

Pending Publication Date: 2021-04-06
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a mark and method for online monitoring of the opening accuracy of the shading sheet of the lithography machine, which is used to solve the problem of excessive shading of the shading sheet of the lithography machine in the prior art. or light leakage, resulting in the problem that the dicing line or WAT test point is affected

Method used

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  • Mark for monitoring opening precision of shading sheet of photoetching machine and using method of mark
  • Mark for monitoring opening precision of shading sheet of photoetching machine and using method of mark
  • Mark for monitoring opening precision of shading sheet of photoetching machine and using method of mark

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Embodiment Construction

[0031] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0032] see Figure 1 to Figure 5 . It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, and only the components related to the present invention are shown in the diagrams rather than the number, shape and shape of the components in actual implementation. Dimensional drawing, the type, quantity and proportion of each component can be changed arb...

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Abstract

The invention provides a mark for monitoring the opening precision of a shading sheet of a photoetching machine and a use method of the mark. The mark comprises a photomask provided with a graphic area and a shading belt surrounding the periphery of the graphic area, labels arranged on inner and outer edges of the shading belt, and an anti-dazzling screen on the photoetching machine, wherein the anti-dazzling screen binds the graphic area and is used for controlling the size of the light-transmitting opening of the photomask, the distance between the outer edge of the shading belt and the graphic area is the precision specification L of the photoetching machine table, the precision rule L is greater than or equal to M and less than or equal to N, the distance between the lable on the inner edge of the shading belt and the graphic area is M/2, and the distance between the label on the outer edge of the shading belt and the graphic area is N+100 microns. By adding the overlay precision labels on the shading belt, online real-time monitoring can be realized, and manpower and machine time are saved; product light leakage or excessive shading caused by the fact that the opening of the anti-dazzling screen is too large or too small is effectively prevented; and through system measurement and grabbing, automatic processing is realized.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a mark and a method for on-line monitoring the opening precision of a shading plate of a lithography machine. Background technique [0002] The Nikon lithography machine determines the light-transmitting area of ​​the pattern on the reticle by controlling the opening size of the Reticle Blind (ARB). [0003] Under normal circumstances, the opening of the ARB is monitored through accuracy, but this method requires an offline machine to operate, and then to watch it with the naked eye on the appearance machine, which is time-consuming and laborious. Second, the accuracy monitoring is placed on the The annual maintenance items will have a delay effect. Once the ARB has a problem, it cannot be caught immediately, resulting in the product being scrapped. [0004] Another method is that the FAB of the factory is currently used more, that is, the manual appearance machine is art...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/42G03F7/20
CPCG03F1/42G03F7/70066G03F7/7085
Inventor 常欢陆捷
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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